Electron attachment to sulfur oxyhalides: SOF2, SOCl 2, SO2 F2, SO2 Cl2, and SO2 FCl attachment rate coefficients, 300-900 K

Journal of Chemical Physics

Volumn 132, Issue 21, 2010, Pages

  Miller, Thomas M ^a,c   Friedman, Jeffrey F ^a,d   Caples, Connor M ^a   Shuman, Nicholas S ^a   Van Doren, Jane M ^b,e   Bardaro Jr , Michael F ^b,f   Nguyen, Pho ^b   Zweiben, Cindy ^b,g   Campbell, Matthew J ^b,h   Viggiano, A A ^a  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b Department of Biology   (United States)

^c BOSTON COLLEGE   (United States)

^d UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^e CENTER FOR DRUG EVALUATION AND RESEARCH   (United States)

^f UNIVERSITY OF WASHINGTON   (United States)

^g PFIZER INC   (United States)

^h Infinity Pharmaceuticals Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATTACHMENT RATE; BOND CLEAVAGES; BRANCHING FRACTIONS; CAPTURE RATE; CHANNEL FORMING; DISSOCIATIVE ATTACHMENT; ELECTRON ATTACHMENT; LANGMUIRS; OXYHALIDES; RATE COEFFICIENTS; TEMPERATURE RANGE;

ACTIVATION ENERGY; ARRHENIUS PLOTS; SULFUR;

PHOTODISSOCIATION;

CHLORINE DERIVATIVE; FLUORINE DERIVATIVE; OXYGEN DERIVATIVE; SULFUR DERIVATIVE;

ARTICLE; CHEMISTRY; ELECTRON; TEMPERATURE;

CHLORINE COMPOUNDS; ELECTRONS; FLUORINE COMPOUNDS; OXYGEN COMPOUNDS; SULFUR COMPOUNDS; TEMPERATURE;

EID: 77953598630     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3427527     Document Type: Article

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