A new instrument for thermal electron attachment at high temperature: NF 3 and CH 3Cl attachment rate constants up to 1100 K

Review of Scientific Instruments

Volumn 80, Issue 3, 2009, Pages

  Miller, Thomas M ^a   Friedman, Jeffrey F ^a   Williamson, John S ^a   Schaffer, Linda C ^b   Viggiano, A A ^a,c,d  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b UNIVERSITY OF NEW MEXICO   (United States)

^c BOSTON COLLEGE   (United States)

^d UNIVERSITY OF PUERTO RICO   (Puerto Rico)

Author keywords

[No Author keywords available]

Indexed keywords

ATTACHMENT RATES; ELECTRON ATTACHMENTS; ELECTRON-ION RECOMBINATIONS; EXTENDED RANGES; FLOW TUBES; FLOWING AFTERGLOWS; HIGH TEMPERATURES; LOW TEMPERATURES; NEW HIGHS; NEW INSTRUMENTS; QUADRUPOLE MASS SPECTROMETERS; REACTANT GAS; THERMAL ELECTRON ATTACHMENTS; UPPER LIMITS;

ELECTRON TUBES; ELECTRONS; LANGMUIR PROBES; MAGNETRONS; MASS SPECTROMETRY; OXIDE MINERALS; PLASMA DENSITY; PROBES; QUARTZ; THERMIONIC EMISSION;

RATE CONSTANTS;

EID: 63649112556     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3097185     Document Type: Article

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