Electron attachment to Cl2 from 300 to 1100 K: Experiment and theory

Physical Review A - Atomic, Molecular, and Optical Physics

Volumn 79, Issue 3, 2009, Pages

  Friedman, Jeffrey F ^a,d   Miller, Thomas M ^b,e   Schaffer, Linda C ^b   Viggiano, A A ^a   Fabrikant, Ilya I ^c  

^a AIR FORCE RESEARCH LABORATORY   (United States)

^b UNIVERSITY OF NEW MEXICO   (United States)

^c UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^d UNIVERSITY OF PUERTO RICO   (Puerto Rico)

^e BOSTON COLLEGE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARRHENIUS BEHAVIORS; ATTACHMENT PROCESS; ATTACHMENT RATES; CROSS SECTIONS; DISSOCIATIVE ELECTRON ATTACHMENTS; ELECTRON ATTACHMENTS; ELECTRON ENERGIES; HIGH TEMPERATURES; HIGHEST TEMPERATURES; LANGMUIR; LOW TEMPERATURES; NON-ARRHENIUS BEHAVIORS; R-MATRIX CALCULATIONS; TEMPERATURE DEPENDENCES; VIBRATIONAL LEVELS;

PHOTODISSOCIATION;

RATE CONSTANTS;

EID: 63549115866     PISSN: 10502947     EISSN: 10941622     Source Type: Journal    
DOI: 10.1103/PhysRevA.79.032707     Document Type: Article

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