Nano-dimple processing of silicon surfaces by femtosecond laser irradiation with dielectric particle templates in the Mie scattering domain

Journal of Physics D: Applied Physics

Volumn 42, Issue 2, 2009, Pages

  Sakai, Tetsuo ^a   Miyanishi, Tomoya ^a   Nedyalkov, Nikolay ^b   Nishizawa, Yuji ^a   Obara, Minoru ^a  

^a KEIO UNIVERSITY   (Japan)

^b INSTITUTE OF ELECTRONICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC PARTICLES; DIFFRACTION LIMITS; FEMTO SECOND LASER PULSE; FEMTOSECOND LASER IRRADIATIONS; HOLE FEATURES; INCIDENT LASERS; INCIDENT LIGHTS; INCIDENT WAVELENGTHS; LONG AXIS; MICRO LENS; MIE SCATTERINGS; NEAR-FIELD INTENSITIES; OPTICAL FIELD INTENSITIES; OPTICAL INTENSITIES; SILICON SUBSTRATES; SILICON SURFACES; SIZE PARAMETERS; TIME-DOMAIN METHODS; WAVELENGTH OF LIGHTS;

BRILLOUIN SCATTERING; DIELECTRIC PROPERTIES; FIBER OPTIC SENSORS; IRRADIATION; LASER BEAMS; LASERS; LENSES; LIGHT; OPTICAL INSTRUMENTS; POLARIZATION; SCATTERING; SUBSTRATES; TIME DOMAIN ANALYSIS; ULTRASHORT PULSES;

PULSED LASER APPLICATIONS;

EID: 63749094730     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/42/2/025502     Document Type: Article

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