New filter rating method in practice for sub 30 nm lithography process filter

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Umeda, Toru ^a   Mizuno, Takehito ^a   Tsuzuki, Shuichi ^a   Numaguchi, Toru ^a  

^a Nihon Pall Ltd   (Japan)

Author keywords

Filtration; gold nanoparticle; lithography; rating method

Indexed keywords

CONCENTRATION DETECTORS; EXTRAPOLATIVE METHODS; GOLD NANOPARTICLE; GOLD NANOPARTICLES; LITHOGRAPHY PROCESS; MICRO-BRIDGE; POLYSTYRENE LATEXES; REMOVAL EFFICIENCIES;

ELECTROMAGNETIC INDUCTION; GOLD; INDUCTIVELY COUPLED PLASMA; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; NANOPARTICLES; POLYSTYRENES; REMOVAL;

LITHOGRAPHY;

EID: 77953522846     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.859457     Document Type: Conference Paper

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