Defect reduction by using point-of-use filtration in a new coater/developer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7273, Issue , 2009, Pages

  Umeda, Toru ^a   Tsuzuki, Shuichi ^a   Numaguchi, Toru ^a  

^a Nihon Pall Ltd   (Japan)

Author keywords

Filter; Nylon 6,6; Photoresist; Point of use filtration

Indexed keywords

COMPARATIVE ANALYSIS; COMPETITIVE ADSORPTION; DEFECT REDUCTION; DIFFERENT SOLVENTS; DOMINANT MECHANISM; FILTER; FILTRATION PRODUCTS; MEMBRANE MATERIAL; MEMBRANE SURFACE; MICRO-BRIDGE; NYLON 6,6; POINT-OF-USE; POINT-OF-USE FILTERS; POINT-OF-USE FILTRATION;

ADSORPTION; AGGLOMERATION; DEFECTS; GELATION; PHOTORESISTORS; POLYAMIDES; PORE SIZE; POROUS MATERIALS; RAYON; SURFACE TREATMENT;

MICROFILTRATION;

EID: 65849226640     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813662     Document Type: Conference Paper

References (6)

1. International Technology Roadmap for Semiconductors, 2007 edition
2. D. Hall et al. "The Effectiveness of sub 50nm Filtration on Reduced Defectivity in Advance Lithography Applications," ARCH Interface, Sept. (2003)
3. T. Umeda et al. "Research of appropriate filter membrane for reducing defects of ArF lithography", FUJIFILM Interface, Oct. (2005) San Diego
4. T. Umeda et al. "Study on Effective Property of Point of Use Filter for Defectivity Reduction in 75nm ArF Lithography and 120nm KrF Lithography", FUJIFILM Interface, Oct. (2006) San Diego
5. Y. Nagata et al. Gel Handbook, NTS Inc., pp.13 (1997)
6. T. Keii, Adsorption, Kyoritsu Shuppan, pp.148 (1983)