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Volumn 7520, Issue , 2009, Pages

Filtration condition study for enhanced microbridge reduction

Author keywords

Adsorption kinetics; Asymmetric; Filtration; Nylon 6,6; Photoresist

Indexed keywords

ADSORPTION KINETICS; ASYMMETRIC; CONTACT TIME; DEFECT PRECURSORS; DEFECT REDUCTION; DEFECTIVITY; FILTER MEDIA; FILTRATION PRODUCTS; FLUID FLOW; HIGH-PRESSURE FILTRATION; KINETIC STUDY; MICRO-BRIDGE; NEXT GENERATION LITHOGRAPHY; OPERATING PROCEDURES; PHOTORESIST PATTERNING; POINT-OF-USE; PRESSURE FILTRATION;

EID: 77952024448     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.837664     Document Type: Conference Paper
Times cited : (15)

References (6)
  • 1
    • 84878400259 scopus 로고    scopus 로고
    • The effectiveness of sub 50nm filtration on reduced defectivity in advanced lithography applications
    • Gotlinsky, B., et al, "The effectiveness of sub 50nm filtration on reduced defectivity in advanced lithography applications," Proc. ARCH Interface Conf. (2003).
    • Proc. ARCH Interface Conf. (2003)
    • Gotlinsky, B.1
  • 2
    • 84878383823 scopus 로고    scopus 로고
    • Research of appropriate filter membrane for reducing defects of ArF lithography
    • Umeda, T., et al, "Research of appropriate filter membrane for reducing defects of ArF lithography," Proc. FUJIFILM Interface Conf. (2005).
    • Proc. FUJIFILM Interface Conf. (2005)
    • Umeda, T.1
  • 3
    • 84878413709 scopus 로고    scopus 로고
    • Study on effective property of point of use filter for defectivity reduction in 75nm ArF lithography and 120nm KrF lithography
    • Umeda, T., et al, "Study on effective property of point of use filter for defectivity reduction in 75nm ArF lithography and 120nm KrF lithography," Proc. FUJIFILM Interface Conf. (2006).
    • Proc. FUJIFILM Interface Conf. (2006)
    • Umeda, T.1
  • 4
    • 65849174602 scopus 로고    scopus 로고
    • Microbridge and e-test opens defectivity reduction via improved filtration of photolithography fluids
    • Mesawich, M., et al, "Microbridge and e-test opens defectivity reduction via improved filtration of photolithography fluids," Proc. SPIE 7273, 72730O (2009).
    • (2009) Proc. SPIE , vol.7273
    • Mesawich, M.1
  • 5
    • 65849226640 scopus 로고    scopus 로고
    • Defect reduction by using point-of-use filtration in a new coater/developer
    • Umeda, T., et al, "Defect reduction by using point-of-use filtration in a new coater/developer," Proc. SPIE 7273, 727374B (2009).
    • (2009) Proc. SPIE , vol.7273
    • Umeda, T.1
  • 6
    • 77952074835 scopus 로고    scopus 로고
    • Filtration pressure dependence of clogging in gel-like undissolved polymer removal from methyl cellulose aqueous solution (3rd. report)
    • th annual meeting, G318 (2009).
    • (2009) th Annual Meeting
    • Sumiya, M.1    Numaguchi, T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.