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Applied Physics Letters

Volumn 96, Issue 23, 2010, Pages

Strain-mediated metal-insulator transition in epitaxial ultrathin films of NdNiO3

(8) Liu, Jian a Kareev, M a Gray, B a Kim, J W b Ryan, P b Dabrowski, B c Freeland, J W b Chakhalian, J a

a UNIVERSITY OF ARKANSAS (United States)

b ARGONNE NATIONAL LABORATORY (United States)

c NORTHERN ILLINOIS UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BULK BEHAVIOR; COMPRESSIVE STRAIN; ELECTRONIC AND STRUCTURAL PROPERTIES; LAYER-BY-LAYER GROWTH; SOFT X-RAY ABSORPTION SPECTROSCOPIES; SRTIO; TEMPERATURE-DEPENDENT RESISTIVITY;

ABSORPTION SPECTROSCOPY; CEMENTS; EPITAXIAL FILMS; METAL INSULATOR BOUNDARIES; SEMICONDUCTOR INSULATOR BOUNDARIES; STRONTIUM COMPOUNDS; TENSILE STRAIN; ULTRATHIN FILMS; X RAY DIFFRACTION;

METAL INSULATOR TRANSITION;

EID: 77953519140 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3451462 Document Type: Article

Times cited : (101)

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