Comparison of star and linear ArF resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Forman, Drew C ^a   Wieberger, Florian ^b   Groeschel, Andre ^b   Müller, Axel H E ^b   Schmidt, Hans Werner ^b   Ober, Christopher K ^a  

^a School of Operations Research and Industrial Engineering   (United States)

^b UNIVERSITY OF BAYREUTH   (Germany)

Author keywords

ArF photoresist; chemically amplified resist; LWR

Indexed keywords

ADAMANTYL METHACRYLATE; ARF RESISTS; BUTYROLACTONES; CHEMICALLY AMPLIFIED RESIST; DEGREE OF POLYMERIZATION; ELECTRON-BEAM EXPOSURE; STAR POLYMERS;

POLYDISPERSITY; POLYMERS; SUGAR (SUCROSE); SURFACE TREATMENT;

PHOTORESISTS;

EID: 77953512609     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.848344     Document Type: Conference Paper

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