Sources and scaling laws for LER and LWR

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Sandstrom, Tor ^a   Rydberg, Christer ^a  

^a Micronic Laser Systems AB   (Sweden)

Author keywords

Budget; CDU; Dynamic; LER; LWR; PSD; SLM; Speckle; Spectra; Static

Indexed keywords

DENSITY MEASUREMENT (OPTICAL); LIGHT SOURCES; MASKS; OPTICS; POWER SPECTRAL DENSITY; PROCESS CONTROL; SENSITIVITY ANALYSIS;

CHEMICAL PROCESSES; COHERENT OPTICAL EFFECTS; LOW IMAGE LOG SLOPES;

SCALING LAWS;

EID: 35148855780     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712248     Document Type: Conference Paper

References (6)

1. V. Constantoudis et al., "Correlation length and the problem of line-width roughness", Proc SPIE. 6518, (2007) (to be published)
2. T. Sandstrom, C. Rydberg, J. Bengtsson, "Dynamic laser speckle in optical projection lithography: causes, effects on CDU and LER, and possible remedies", Proc. SPIE 5754, pp. 274-284 (2005)
3. C. Rydberg, J. Bengtsson, T. Sandstrom, "Dynamic laser speckle as a detrimental phenomenon in optical projection lithography ", J. Microlith., Microfab., Microsyst. 5, 033004 (2006)
4. C. Rydberg, J. Bengtsson, G. B. Yuan, T. Sandstrom, "Diffractive optical elements for the homogenization of partially coherent light" (to be published)
5. G. M. Gallatin, "Resist Blur and Line Edge Roughness", Proc SPIE. 5754, pp. 38-52 (2005)
6. G. Schmid et al., "Understanding Molecular Level Effects during Post Exposure Processing", Proc. SPIE. 4345, pp. 1037-1047 (2001)