The use of nanocomposite materials for high refractive index immersion lithography

Journal of Photopolymer Science and Technology

Volumn 21, Issue 5, 2008, Pages 621-629

  Zimmerman, Paul A ^a   Rice, Bryan ^a   Rodriguez, Robert ^b   Zettel, Michael F ^b   Trikeriotis, Markos ^b   Wang, Dongyan ^b   Yi, Yi ^b   Woo, Jin Bae ^b   Ober, Christopher K ^b   Giannelis, Emmanuel P ^b  

^a SEMATECH   (United States)

^b Department of Obstetrics Gynecology

Author keywords

193nm immersion lithograph; Fluid; Nanocomposite; Nanoparticle; Refractive index; Resist

Indexed keywords

EID: 51249098096     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.21.621     Document Type: Article

References (28)

1. B.W. Smith, Y. Fan, J. Zhou, A. Bourov, , L. Zavyalova, E. Piscani, J. Park, D. Summers, K. Wolf, F. Cropanese, RIT Center for Nanolithography Research - Immersion fluids update,(2004) http://www.microe.rit.edu/ research/lithography/research/immersion.html
2. T. Miyamatsu, Y. Wang, M. Shima, S. Kusumoto, T. Chiba, H. Nakagawa, K. Hieda, T. Shimokawa, Advances in Resist Technology and Processing XXII. Edited by J.L Sturtevant, Proc. of the SPIE, Volume 5753, pp. 10-19 (2005)
3. R. H. French, V. Liberman, H. V. Tran, J. Feldman, D. J. Adelman, R. C. Wheland, W. Qiu, S. J. McLain, O. Nagao, M. Kaku, M. Mocella, M. K. Yang, M. F. Lemon, L. Brubaker, A. L. Shoe, B. Fones, B. E. Fischel, K. Krohn, D. Hardy, C. Y. Chen. Volume 6520, pp. SPIE 2007.
4. J. Santillan, A. Otoguro, T. Itani, K. Fujii, A. Kagayama, T. Nakano, N. Nakayama, T Norio; H. Tmatani, S Fukuda, Optical Microlithography XIX. Edited by Flagello, Donis G. Proceedings of the SPIE, Volume 6154, pp. 1592-1599 (2006).
5. P. A. Zimmerman, J.Byers, B.Rice, C.K. Ober, E.P. Giannelis, R.Rodriguez, D.Wang, N.O'Connor, X.Lei, N. J. Turro, V.Liberman S. Palmacci,; M.Rothschild, N. Lafferty, B. W. Smith, Proc. SPIE, In Press (2008)
6. th Intl. Symp. on Immersion Lithography, Keystone Colorado ,USA, Oct 2007.
7. th Intl. Symp. on Immersion Lithography, Keystone Colorado ,USA, Oct 2007.
8. P.A.Zimmerman, C.Van Peski, B. Rice, J. Byers, N.J.Turro, X. Lei, J.L Gejo, V. Liberman, S. Palmacci, M. Rothschild, A. Whittaker, I.Blakey, L. Chen, B. Dargaville and Heping Liu, J. Poly. Sci Tech., 20(5), 643-650, 2007
9. V. Liberman, M. Rothschild, S. T. Palmacci, P. A. Zimmerman, A. Grenville, , Advances in Resist Materials and Processing Technology XXIV, edited by L.Qinghuang, Proc. of SPIE Vol. 6519, 651921, (2007)
10. th Intl. Symp.on Immersion Lithography, Keystone Colorado ,USA, Oct 2007.
11. th Intl. Symp. on Immersion Lithography, Keystone Colorado ,USA, Oct 2007.
12. B.W. Smith, J. Zhou, F. Fan, A. Bourov, Applied Optics, Vol. 45, Issue 13, pp. 3077-3082, (2006).
13. rd Intl. Symp. on Immersion Lithography, Kyoto, Japan, Oct 2006.
14. B.W. Smith, J. Zhou, Proc. SPIE Optical Microlithography, In Press (2007).
15. K.E. Peiponen and E. M Vartitianen, Physical rev. B, 44(15), p 8301, 1991.
16. J-L. Gejo, J. T. Kunjappu, J. Zhou, B. W. Smith, P. Zimmerman, W. Conley, and N. J. Turro, Chem. Mater. 2007, 19, 3641-3647
17. .S. Ando and M Ueda, J. Polymer Sci Tech., 16(4), 537-544, 2003
18. rd Intl. Symp. on Immersion Lithography, Kyoto, Japan, Oct 2006.
19. rd Intl. Symp. on Immersion Lithography, Kyoto, Japan, Oct 2006.
20. th Intl. Symp. on Immersion Lithography, Keystone Colorado ,USA, Oct 2007.
21. Testbourne Optical materials, http://www.testbourne.com/pages/supervac/ showsupervac.asp?symbol=HfO2&material_name=Hafnium%20Oxide
22. Cao Li, Su Xiyu, Wu Zhenyu, Zou Bingsuo, and Dai Jiahua, Xie Sishen, , Chemical Journal on Internet, 2002, Vol.4 No.9 p.45
23. I. Sondi, T.H. Fedynyshyn, R. Sinta, E. Matijevic, Langmuir 2000, 16, 9031-9034
24. T.H. Fedynyshyn et al., Resist Technology,Proc.of SPIE Vol. 3999 (2000)
25. T.H. Fedynyshyn et al, Proc. SPIE Vol. 4345 (2001)
26. "Zeta Potential of Colloids in Water and Waste Water", ASTM Standard D 4187-82, American Society for Testing and Materials, 1985
27. J. Tang, J. Fabbri, R. D. Robinson, Y. Zhu, I. P. Herman, M. L. Steigerwald, L. E. Brus, Chem. Mater., 16, 1336 (2004)
28. M. Niederberger, M.H. Bartl, G.D.Stucky, Chem. Mater. 2002, 14, 4364-4370