Modeling thermal radiative properties of nano scale multilayer with incoherent formulation

World Academy of Science, Engineering and Technology

Volumn 37, Issue , 2009, Pages 922-928

  Oloomi, S A A ^a   Saboonchi, A ^a   Sedaghat, A ^a  

^a ISLAMIC AZAD UNIVERSITY   (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

COATING THICKNESS; EMITTANCE; INCIDENT RADIATION; LAYER 1; MEMS/NEMS; MODERN TECHNOLOGIES; MULTILAYER STRUCTURES; NANO SCALE; RADIATIVE PROPERTIES; SEMICONDUCTOR PROCESSING; SEMITRANSPARENT WAFERS; SILICON DIOXIDE; SILICON NITRIDE COATING; THERMAL RADIATIVE PROPERTIES; THERMAL SCIENCE; THIN FILM SOLAR CELLS; THIN-FILM COATINGS; WAFER TEMPERATURE;

COATINGS; FILM PREPARATION; HEAT RADIATION; MULTILAYERS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON NITRIDE; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; THIN FILM DEVICES;

SILICON WAFERS;

EID: 77953489310     PISSN: 2010376X     EISSN: 20103778     Source Type: Journal    
DOI: None     Document Type: Article

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