Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering

Chinese Optics Letters

Volumn 8, Issue SUPPL., 2010, Pages 73-77

  Jakobs, Stefan ^a   Lappschies, Marc ^a   Schallenberg, Uwe ^a   Stenzel, Olaf ^b   Wilbrandt, Steffen ^b  

^a Mso Jena Mikroschichtoptik GmbH   (Germany)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FILM ROUGHNESS; FILM STRESS; HIGH POTENTIAL; HIGH REFRACTIVE INDEX; MEASUREMENT RESULTS; METAL OXIDE THIN FILMS; MICRO-ROUGHNESS; MULTILAYER STACKS; OPTICAL INDICES; PROCESS STABILITY; REACTIVE MAGNETRON SPUTTERING; SINGLE LAYER; SPECTRAL PERFORMANCE; SPECTRAL TRANSMITTANCE; THERMAL SHIFT;

FILM PREPARATION; MECHANICAL PROPERTIES; OPTICAL COATINGS; OXIDE FILMS; REFRACTIVE INDEX; SILICON COMPOUNDS; STRESSES; TANTALUM;

OPTICAL FILMS;

EID: 77953244814     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: 10.3788/COL201008S1.0073     Document Type: Article

References (6)

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3. O. Stenzel, The Physics of Thin Film Optical Spectra: An Introduction (Springer-Verlag, Berlin Heidelberg, 2005).
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