Effect of electron irradiation on properties of chemically deposited TiO2 nanorods

Journal of Alloys and Compounds

Volumn 499, Issue 1, 2010, Pages 63-67

  Dhawale, D S ^a   Dubal, D P ^a   Salunkhe, R R ^a   Gujar, T P ^a   Rath, M C ^b   Lokhande, C D ^a  

^a SHIVAJI UNIVERSITY   (India)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

CBD; Electron irradiation; Nanorods; Thin films; TiO2

Indexed keywords

BAND GAPS; CBD; CRYSTALLINE STRUCTURE; ELECTRICAL RESISTIVITY; ELECTRON BEAM IRRADIATION; ELECTRON BOMBARDMENTS; GLASS SUBSTRATES; HIGH ENERGY; MATERIAL PROPERTY; OPTICAL AND ELECTRICAL PROPERTIES; RED SHIFT; ROOM TEMPERATURE; SOFT-CHEMICAL ROUTE; TIO;

CONTACT ANGLE; ELECTRIC CONDUCTIVITY; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONS; NANORODS; OPTICAL PROPERTIES; RADIATION; SUBSTRATES; THIN FILMS;

ELECTRON IRRADIATION;

EID: 77953171346     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2010.01.126     Document Type: Article

References (22)

1. Regan B.O., and Gratzel M. Nature 353 (1991) 737
2. Hoffmann M.R., Martin S.T., Choi W., and Bahnemann D.W. Chem. Rev. 95 (1995) 69
3. Naoi K., Ohko Y., and Tatsuma T. J. Am. Chem. Soc. 125 (2003) 3664
4. Zhu Y., Shi J., Zhang Z., Zhang C., and Zhang X. Anal. Chem. 74 (2002) 120
5. Wu N., Wang S., and Rusakova I.A. Science 285 (1999) 1375
6. Irie H., Washizuka S., and Hashimota K. Thin Solid Films 510 (2006) 21
7. Monoy A., Brevet A., Imhoff L., Domenichini B., Lesniewska E., Peterle P.M., Macro de Lucas M.C., and Bourgeois S. Thin Solid Films 515 (2006) 687
8. Mane R.S., Hwang Y.H., Lokhande C.D., Sartale S.D., and Han S.H. Appl. Surf. Sci. 246 (2005) 271
9. Lokhande C.D., Lee E.H., Jung K.D., and Joo O.S. J. Mater. Sci. 39 (2004) 2915
10. Sankapal B.R., Lux-Steiner M.Ch., and Ennaoui A. Appl. Surf. Sci. 239 (2005) 165
11. Pathan H.M., Min S.K., Desai J.D., Jung K.D., and Joo O.S. Mater. Chem. Phys. 97 (2005) 5
12. Overschelde O.V., Snyders R., and Wautelet M. Appl. Surf. Sci. 254 (2007) 971
13. Steen W.M. Laser Material Processing (2005), Springer, Berlin
14. Thakurdesai M., Mahadkar A., Kulriya P.K., Kanjilal D., and Bhattacharyya V. Nucl. Instrum. Methods Phys. Res. B 266 (2008) 1343
15. Houa X.G., and Liua A.D. Radiat. Phys. Chem. 77 (2008) 345
16. Jun J., Dhayal M., Shin J.H., Kim J.C., and Getoff N. Radiat. Phys. Chem. 75 (2006) 583
17. Guha S.N., Moorthy P.N., Kishore K., Naik D.B., and Rao K.N. Proc. Indian Acad. Sci. (Chem. Sci.) 99 (1987) 261
18. Rath M.C., Sunitha Y., Ghosh H.N., Sarkar S.K., and Mukherjee T. Radiat. Phys. Chem. 78 (2009) 77
19. Kale S.S., Mane R.S., Chung H., Yoon M.Y., Lokhande C.D., and Han S.H. Appl. Surf. Sci. 253 (2006) 421
20. Sun R.D., Nakajima A., Fujushima A., Watanabe T., and Hashimoto K. J. Phys. Chem. B 105 (2001) 1984
21. de Gennes P.G. Rev. Modern Phys. (1985) 830
22. Holland L., and Siddall G. Vacuum 3 (1953) 373