Room temperature chemical deposition of amorphous TiO2 thin films from Ti(III) chloride solution

Journal of Materials Science

Volumn 39, Issue 8, 2004, Pages 2915-2918

  Lokhande, C D ^a   Lee, Eun Ho ^a   Jung, Kwang Deog ^a   Joo, Oh Shim ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; AMORPHOUS FILMS; COATING TECHNIQUES; DEGRADATION; DEPOSITION; ELECTRON BEAMS; EVAPORATION; GLASS; HYDROLYSIS; INDIUM COMPOUNDS; NANOSTRUCTURED MATERIALS; PHOTOCATALYSIS; SCANNING ELECTRON MICROSCOPY; TITANIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

ELECTRON BEAM EVAPORATION; FILM THICKNESS; PHOTOCATALYTIC DEGRADATION; PHOTOSENSITIZATION;

THIN FILMS;

EID: 2142704352     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSC.0000021480.40562.09     Document Type: Article

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