ZnO sensing film thickness effects on the sensitivity of surface plasmon resonance sensors with angular interrogation

Materials Science and Engineering: B

Volumn 171, Issue 1-3, 2010, Pages 155-158

  Bao, Ming ^a   Li, Ge ^a   Jiang, Dongmei ^a   Cheng, Wenjuan ^a   Ma, Xueming ^a  

^a EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

Sensing films; Surface plasmon resonance; ZnO

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM THICKNESS; GLASS SUBSTRATES; II-VI SEMICONDUCTORS; MAGNETRONS; METALLIC FILMS; REFRACTIVE INDEX; SENSITIVITY ANALYSIS; SILVER; SILVER COMPOUNDS; SPECTROSCOPIC ELLIPSOMETRY; SURFACE PLASMON RESONANCE;

ATOMIC FORCE; FILM-THICKNESS; GLASS SUBSTRATES; RADIO-FREQUENCY-MAGNETRON SPUTTERING; RESONANCE CURVES; SENSING FILMS; SURFACE PLASMON RESONANCE SENSOR; SURFACE-PLASMON RESONANCE; THICKNESS EFFECT; ZNO FILMS;

ZINC OXIDE;

EID: 77953133803     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2010.03.090     Document Type: Article

References (26)

1. Homola J., Yee S.S., and Gauglitz G. Sens. Actuators B 54 (1999) 3-15
2. Rich R.L., and Myszka D.G. Curr. Opin. Biotechnol. 11 (2000) 54-61
3. Liedberg B., Nylander C., and Lundstrom I. Sens. Actuators 4 (1983) 299-304
4. Ozdemir S.K., and Sayan G.T. J. Lightwave Technol. 21 (2003) 805-814
5. Chang H.P., Wang Y.C., Leung P.T., and Tse W.S. Opt. Commun. 188 (2001) 283-289
6. Manera M.G., Leo G., Curri M.L., Cozzoli P.D., Rella R., Siciliano P., Agostiano A., and Vasanelli L. Sens. Actuators B 100 (2004) 75-80
7. Gupta G., Sugimoto M., Matsui Y., and Kodon J. Sens. Actuators B 130 (2008) 689-695
8. de Julián Fernández C., Manera M.G., Pellegrini G., Bersani M., Mattei G., Rella R., Vasanelli L., and Mazzoldi P. Sens. Actuators B 130 (2008) 531-537
9. Feng W.Y., Chiu N.F., Lu H.H., Shih H.C., Yang D.F., and Lin C.W. J. Bionanosci. 2 1 (2008) 62-66
10. Özgür U., Alivov Ya.I., Liu C., Teke A., Reshchikov M.A., Doǧan S., Avrutin V., Cho S.J., and Morkoc H. J. Appl. Phys. 98 (2005) 041301-041404
11. Schmidt-Mende L., and MacManus-Driscoll J.L. Mater. Today 10 (2007) 40-48
12. Lai C.W., An J., and Ong H.C. Appl. Phys. Lett. 86 (2005) 251105
13. Cheng X.L., Zhao H., Huo L.H., Gao S., and Zhao J.G. Sens. Actuators B 102 (2004) 248-252
14. Xu J., Chen Y., Chen D., and Shen J. Sens. Actuators B 113 (2006) 526-531
15. Bhattacharyya P., Basu P.K., Saha H., and Basu S. Sens. Actuators B 124 (2007) 62-67
16. Lim H.J., Lee D.Y., and Oh Y.J. Sens. Actuators A 125 (2006) 405-410
17. Lin B., Fu Z., and Jia Y. Appl. Phys. Lett. 79 (2001) 943-945
18. Xu H., Liu X., Cui D., Li M., and Jiang M. Sens. Actuators B 114 (2006) 301-307
19. Kretschmann E. Z. Phys. 241 (1971) 313-324
20. Salamon Z., Macleod H.A., and Tollm G. Biochim. Biophys. Acta 1331 (1997) 117
21. Fontana E., and Pantel R.H. Phys. Rev. B 37 (1988) 3264
22. Sari S.O., Cohen D.K., and Scherkoske K.D. Phys. Rev. B 21 (1980) 2162
23. Damos F.S., Luz R.C.S., and Kubota L.T. Langmuir 21 (2005) 602
24. Kang X., Jin Y., Cheng G., and Dong S. Langmuir 18 (2002) 1713
25. Volintiru I., Creatore M., and van de Sanden M.C.M. J. Appl. Phys. 103 (2008) 033704
26. Pockrand I. Surf. Sci. 32 (1978) 577-580