Surface plasmon resonance biochip based on ZnO thin film for nitric oxide sensing

Journal of Bionanoscience

Volumn 2, Issue 1, 2008, Pages 62-66

  Feng, Wei Yi ^a   Chiu, Nan Fu ^a   Lu, Hui Hsin ^a   Shih, Hsueh Ching ^b   Yang, Dongfang ^c   Lin, Chii Wann ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Gas sensor; Nitric oxide; Surface plasmon resonance; Zinc oxide; ZnO thin film

Indexed keywords

CONCENTRATION (PROCESS); METALLIC FILMS; NITRIC OXIDE; NITRIDES; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; PLASMONS; REFRACTIVE INDEX; RESONANCE; SEMICONDUCTING ZINC COMPOUNDS; SENSORS; SURFACE PLASMON RESONANCE; THICK FILMS; THIN FILM DEVICES; THIN FILMS; ZINC; ZINC ALLOYS; ZINC OXIDE;

BIOCHEMICAL SENSORS; CALIBRATION CURVES; ELECTRICAL AND OPTICAL PROPERTIES; GAS SENSOR; GOLD FILMS; OXIDE LAYERS; REFLECTANCE INTENSITIES; RESONANCE ANGLES; RESPONSE INTENSITIES; SURFACE PLASMON RESONANCE SENSING; SURFACE PLASMONS; ZINC OXIDE FILMS; ZNO THIN FILM; ZNO THIN FILMS;

OXIDES;

EID: 56749170439     PISSN: 15577910     EISSN: None     Source Type: Journal    
DOI: 10.1166/jbns.2008.028     Document Type: Article

References (16)

1. K. M. Ashutosh, Current Opinion in Pulmonary Medicine 6, 21 (2000).
2. B. H. Cuthbertson, S. Stott, and N. R. Webster, British Journal of Anaesthesia 78, 696 (1997).
3. M. E. Franke, T. J. Koplin, and U. Simon, Small 2, 36 (2006).
4. D. P. Norton, Y. W. Heo, M. P. Ivill, K. Ip, S. J. Pearton, M. F. Chisholm, and T. Steiner, Mater. Today 7, 34 (2004).
5. J. Anderson and G. V. D. W. Chris, Appl. Phys. Lett. 87, 122102 (2005).
6. T. K. Subramanyam, B. S. Naidu, and S. Uthanna, Cryst. Res. Technol. 35, 1193 (2000).
7. M. Suchea, S. Christoulakis, K. Moschovis, N. Katsarakis, and G. Kiriakidis, Thin Solid Films 515, 551 (2003).
8. W. Water and S.-Y. Chu, Mater. Lett. 55, 67 (2002).
9. K. Nagata and H. H., (eds.), Real-Time Analysis of Biomolecular Interactions, Springer-Verlag, Tokyo (2000).
10. C.-W. Lin, K.-P. Chen, M.-C. Su, T.-C. Hsiao, S.-S. Lee, S. Lin, X.-J. Shi, and C.-K. Lee, Sens. Actuators, B: Chemical 117, 219 (2006).
11. J. Homola, S. S. Yee, and G. Gauglitz, Sens. Actuators, B: Chemical 54, 3 (1999).
12. A. V. Samoylov, V. M. Mirsky, Q. Hao, C. Swart, Y. M. Shirshov, and O. S. Wolfbeis, Sens. Actuators, B: Chemical 106, 369 (2005).
13. A. M. Gas'kov and M. N. Rumyantseva, Russ. J. Appl. Chem. 74, 440 (2001).
14. C. H. Ong, J. H. Wang, H. Gong, and H. S. O. Chan, International Journal of Modern Physics B: Condensed Matter Physics; Statistical Physics; Applied Physics 16, 314 (2002).
15. K.-S. Ahn, S. Shet, T. Deutsch, C.-S. Jiang, Y. Yan, M. Al-Jassim, and J. Turner, J. Power Sources 176, 387 (2008).
16. M.-C. Jeong, B.-Y. Oh, O.-H. Nam, T. Kim, and J.-M. Myoung, Nanotechnology 17, 526 (2006).