Preparation and optical characterization of ZnO thin film for optoelectronic applications

2009 International Conference on Emerging Trends in Electronic and Photonic Devices and Systems, ELECTRO '09

Volumn , Issue , 2009, Pages 497-499

  Elilarassi, R ^a   Chandrasekaran, G ^a  

^a PONDICHERRY UNIVERSITY   (India)

Author keywords

Morphology; Optical Band gap; Photoluminescence; XRD; Zinc oxide thin film

Indexed keywords

ENERGY GAP; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; II-VI SEMICONDUCTORS; LIME; METALLIC FILMS; MORPHOLOGY; OPTICAL BAND GAPS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; PHOTONIC DEVICES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION; ZINC OXIDE; ZINC SULFIDE;

ENERGY DISPERSIVE ANALYSIS; HEXAGONAL WURTZITE STRUCTURE; OPTICAL BAND GAP ENERGY; OPTICAL CHARACTERIZATION; OPTOELECTRONIC APPLICATIONS; SODA LIME GLASS SUBSTRATE; STRUCTURAL AND OPTICAL PROPERTIES; ZINC OXIDE THIN FILMS;

OPTICAL FILMS;

EID: 77952570061     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/electro.2009.5441056     Document Type: Conference Paper

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