Photoluminescence observations of hydrogen incorporation and outdiffusion in ZnO thin films

Journal of Luminescence

Volumn 124, Issue 1, 2007, Pages 162-166

  Li, Fan ^a   Wang, Li ^a   Dai, Jiangnan ^a   Pu, Yong ^a   Fang, Wenqing ^a   Jiang, Fengyi ^a  

^a NANCHANG UNIVERSITY   (China)

Author keywords

Atmospheric pressure metalorganic chemical vapor deposition (AP MOCVD); Hydrogen; Photoluminescence; ZnO

Indexed keywords

ATMOSPHERIC PRESSURE; DIFFUSION; FILM GROWTH; HYDROGEN BONDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOLUMINESCENCE; ZINC OXIDE;

EXCITON PEAK; HYDROGEN-PRESENT AMBIENT; OUTDIFFUSION;

THIN FILMS;

EID: 33751179199     PISSN: 00222313     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jlumin.2006.02.013     Document Type: Article

References (25)

1. Guo X.-L., Choi J.-H., Tabata H., and Kawai T. Jpn. J. Appl. Phys. 40 (2001) 177
2. Cao H., Zhao Y.G., Ho S.T., Seelig E.W., Wang Q.H., and Chang R.P.H. Phys. Rev. Lett. 82 (1999) 2278
3. Tang Z.K., Wong G.K.L., and Yu P. Appl. Phys. Lett. 72 (1998) 3270
4. van de Walle C.G., and Neugebauer J. Nature 423 (2003) 626
5. van de Walle C.G. Phys. Rev. Lett. 85 (2000) 1012
6. van de Walle C.G. Phys. Status Solidi B 229 (2002) 221
7. Kilic C., and Zunger A. Appl. Phys. Lett. 81 (2002) 73
8. Shi W.S., Agyeman O., and Xu C.N. J. Appl. Phys. 91 (2002) 5640
9. Baik S.J., Jang J.H., Lee C.H., Cho W.Y., and Lim K.S. Appl. Phys. Lett. 70 (1997) 3516
10. Zhou Z., Kato K., Komaki T., Yoshino M., Yukawa H., Morinaga M., and Morita K. J. Eur. Ceram. Soc. 24 (2004) 139
11. Theys B., Sallet V., Jomard F., Lusson A., Rommeluere J.-F., and Teukam Z. J. Appl. Phys. 91 (2002) 3922
12. Ohashi N., Ishigaki T., Okada N., Sekiguchi T., Sakaguchi I., and Haneda H. Appl. Phys. Lett. 80 (2002) 2869
13. Ohashi N., Ishigaki T., Okada N., Taguchi H., Sakaguchi I., Hishita S., Sekiguchi T., and Haneda H. J. Appl. Phys. 93 (2003) 6386
14. Strzhemechny Y.M., Nemergut J., Smith P.E., Bae J., Look D.C., and Brillson L.J. J. Appl. Phys. 94 (2003) 4256
15. Strzhemechny Y.M., Mosbacker H.L., Look D.C., Reynolds D.C., Litton C.W., Garces N.Y., Giles N.C., Halliburton L.E., Niki S., and Brillson L.J. Appl. Phys. Lett. 84 (2004) 2545
16. Look D.C., Jones R.L., Sizelove J.R., Garces N.Y., Giles N.C., and Halliburton L.E. Phys. Status Solidi A 195 (2003) 171
17. Meyer B.K., Alves H., Hofmann D.M., Kriegseis W., Forster D., Bertram F., Christen J., Hoffmann A., StraBburg M., Dworzak M., Haboeck U., and Rodina A.V. Phys. Status Solidi B 241 (2004) 231
18. Myong S.Y., and Lim K.S. Appl. Phys. Lett. 82 (2003) 3026
19. Zhou Z., Kato K., Komaki T., Yoshino M., Yukawa H., and Morinaga M. Int. J Hydrogen Energ. 29 (2004) 323
20. Ip K., Overberg M.E., Heo Y.W., Norton D.P., Pearton S.J., Kucheyev S.O., Jagadish C., Williams J.S., Wilson R.G., and Zavada J.M. Appl. Phys. Lett. 81 (2002) 3996
21. Ip K., Overberg M.E., Heo Y.W., Norton D.P., Pearton S.J., Stutz C.E., Luo B., Ren F., Look D.C., and Zavada J.M. Appl. Phys. Lett. 82 (2003) 385
22. Ip K., Overberg M.E., Heo Y.W., Norton D.P., Pearton S.J., Stutz C.E., Kucheyev S.O., Jagadish C., Williams J.S., Luo B., Ren F., Look D.C., and Zavada J.M. Solid-State Electron. 47 (2003) 2255
23. Dai J., Liu H., Fang W., Wang L., Pu Y., Chen Y., and Jiang F. J. Cryst. Growth 283 (2005) 93
24. Wang L., Pu Y., Fang W., Dai J., Chen Y., Mo C., and Jiang F. J. Cryst. Growth 283 (2005) 87
25. Thonke K., Gruber T., Teofilov N., Schonfelder R., Waag A., and Sauer R. Physica B 308-310 (2001) 945