A-SiC:H films deposited by PECVD for MEMS applications

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 7, Issue 3-4, 2010, Pages 786-789

  Pelegrini, Marcus V ^a   Rehder, Gustavo P ^a   Pereyra, Inés ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

A-SIC:H; AS-DEPOSITED FILMS; DEPOSITION CONDITIONS; MEMS APPLICATIONS; PLASMA CONDITIONS; POST DEPOSITION ANNEALING; POWER DENSITIES; STRESS FREE; YOUNG'S MODULUS;

CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE;

PLASMA DEPOSITION;

EID: 77952557995     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200982888     Document Type: Conference Paper

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