-
1
-
-
84892323508
-
Standard terminology relating to liquid particles and atomization
-
American Society for Testing and Materials. E1620-97, ASTM International, West Conshohockon, PA, v.
-
American Society for Testing and Materials. E1620-97, "Standard Terminology Relating to Liquid Particles and Atomization," in Annual Book of ASTM Standards v. 14.02 General Test Methods; Forensic Sciences; Terminology; Conformity Assessment; Statistical Methods, ASTM International, West Conshohockon, PA, v. 14.02 (1997)
-
(1997)
Annual Book of ASTM Standards V. 14.02 General Test Methods; Forensic Sciences; Terminology; Conformity Assessment; Statistical Methods
, vol.14
, pp. 02
-
-
-
2
-
-
0000984103
-
Sputtering yield measurements
-
ed. R Behrisch, Springer Verlag, Berlin
-
Andersen HH and Bay HL, "Sputtering Yield Measurements," in Sputtering by Particle Bombardment I, Physical Sputtering of Single-Element Solids, ed. R Behrisch, Springer Verlag, Berlin, 145-218 (1981).
-
(1981)
Sputtering by Particle Bombardment I, Physical Sputtering of Single-Element Solids
, pp. 145-218
-
-
Andersen, H.H.1
Bay, H.L.2
-
4
-
-
0001523330
-
A model for surface damage in ion-irradiated solids
-
Averbeck RS, Ghaly M, "A Model for Surface Damage in Ion-Irradiated Solids," Journal of Applied Physics, 76,6, 3908 (1994).
-
(1994)
Journal of Applied Physics
, vol.76
, Issue.6
, pp. 3908
-
-
Averbeck, R.S.1
Ghaly, M.2
-
5
-
-
0024037767
-
Ion beam induced roughness and its effect in AES depth profiling of multilayer NiICr thin films
-
Bama A, Barna, PB, Zalar A, "Ion Beam induced roughness and its effect in AES depth profiling of multilayer NiICr thin films," Surface and Interface Analysis, 12 1-2, 144-150 (1988).
-
(1988)
Surface and Interface Analysis
, vol.12
, Issue.1-2
, pp. 144-150
-
-
Bama, A.1
Barna, P.B.2
Zalar, A.3
-
6
-
-
0025637466
-
Analysis of the development of large area surface topography during ion etching
-
Bama A and Barna PB, Zalar, A, "Analysis of the development of large area surface topography during ion etching," Vacuum, 40, 1-2, 115-120 (1990).
-
(1990)
Vacuum
, vol.40
, Issue.1-2
, pp. 115-120
-
-
Bama, A.1
Barna, P.B.2
Zalar, A.3
-
7
-
-
33444462386
-
Introduction and overview
-
ed. R Behrisch, Springer Verlag, Berlin
-
Behrisch R, "Introduction and Overview," in Sputtering by Particle Bombardment I, Physical Sputtering of Single-Element Solids, ed. R Behrisch, Springer Verlag, Berlin, 1-8. (1981).
-
(1981)
Sputtering by Particle Bombardment I, Physical Sputtering of Single-Element Solids
, pp. 1-8
-
-
Behrisch, R.1
-
8
-
-
84892253277
-
-
FEI Focused Ion Beam Application Note, FEI Company 7451 NE Evergreen Parkway; Hillsboro, OR 97124
-
FEI Focused Ion Beam Application Note, "High Aspect Ratio Hole Drilling Using FIB Enhanced Etch Process," FEI Company 7451 NE Evergreen Parkway; Hillsboro, OR 97124, (1993).
-
(1993)
High Aspect Ratio Hole Drilling Using FIB Enhanced Etch Process
-
-
-
9
-
-
0023831723
-
-
Franklin RE, Kirk ECC, Cleaver JRA, and Ahmed H, Journal of Materials Science Letters 7, 39 (1988).
-
(1988)
Journal of Materials Science Letters
, vol.7
, pp. 39
-
-
Franklin, R.E.1
Kirk, E.C.C.2
Cleaver, J.R.A.3
Ahmed, H.4
-
10
-
-
0004132814
-
-
Dowden, hutchinson, and ross, Inc. Stroudsburg PA
-
Gibbons JF, Johnson WS, Mylroie SW, Projected Range Statistics: Semiconductors and Related Materials, Dowden, Hutchinson, and Ross, Inc. Stroudsburg, PA, pp. 3-27. (1975).
-
(1975)
Projected Range Statistics: Semiconductors and Related Materials
, pp. 3-27
-
-
Gibbons, J.F.1
Johnson, W.S.2
Mylroie, S.W.3
-
12
-
-
0025930020
-
Recommendations of the international commission on radiological protection
-
ICRP 60-1990, Edited by ICRP
-
ICRP 60-1990, "Recommendations of the International Commission on Radiological Protection," in Annals of the ICRP Vol. 2111-3 Edited by ICRP (1991)
-
(1991)
Annals of the ICRP
, pp. 2111-2113
-
-
-
13
-
-
0000550984
-
Transmission electron microscope sample preparation using a focused ion beam
-
Ishitani T, Tsuboi H, Yaguchi T, and Koike H, "Transmission Electron Microscope Sample Preparation Using a Focused Ion Beam," J. Electron Microsc., Vol43, pp. 322-26 (1994).
-
(1994)
J. Electron Microsc.
, vol.43
, pp. 322-326
-
-
Ishitani, T.1
Tsuboi, H.2
Yaguchi, T.3
Koike, H.4
-
14
-
-
0035326272
-
Ion channeling effects on the FIB milling of copper
-
MayIJun
-
Kempshall BW, Schwm SM, Prenitzer BI, Giannuzzi LA, and Stevie FA, "Ion Channeling Effects on the FIB Milling of Copper," Journal of Vacuum Science & Technology B, 19(3), 749-754 (MayIJun 2001).
-
(2001)
Journal of Vacuum Science & Technology B
, vol.19
, Issue.3
, pp. 749-754
-
-
Kempshall, B.W.1
Schwm, S.M.2
Prenitzer, B.I.3
Giannuzzi, L.A.4
Stevie, F.A.5
-
16
-
-
3943088820
-
Ion bombardment effects on material composition
-
ed. J K Hirvonen, Academic Press, New York, NY
-
Liau, ZL and Mayer, JW, "Ion Bombardment Effects on Material Composition," in Treatise on materials Science and Technology, ed. J K Hirvonen, Academic Press, New York, NY 17-50 (1980)
-
(1980)
Treatise on Materials Science and Technology
, pp. 17-50
-
-
Liau, Z.L.1
Mayer, J.W.2
-
17
-
-
0000827191
-
Range concepts on heavy ion ranges (Notes on Atomic Collisions 11)
-
Lindhard J, Scharff M, and Schiott HE, "Range Concepts on Heavy Ion Ranges" (Notes on Atomic Collisions 11), Mat. Fys. Medd. Dan. Vid. Selsk. 33, No. 14, p15. (1963).
-
(1963)
Mat. Fys. Medd. Dan. Vid. Selsk.
, vol.33
, Issue.14
, pp. 15
-
-
Lindhard, J.1
Scharff, M.2
Schiott, H.E.3
-
19
-
-
0011194826
-
EBSP investigation of focused ion beam surfaces
-
Matteson TL, Kempshall BW, Schwarz SW, Houge EC, and Giannuzzi LA, "EBSP Investigation of Focused Ion Beam Surfaces," Journal of Electronic Materials, 31(1), 33-39 (2002).
-
(2002)
Journal of Electronic Materials
, vol.31
, Issue.1
, pp. 33-39
-
-
Matteson, T.L.1
Kempshall, B.W.2
Schwarz, S.W.3
Houge, E.C.4
Giannuzzi, L.A.5
-
22
-
-
0141483968
-
-
Kluwer Academic/ Plenum Publishers, NY
-
Orloff J, Utlaut M, and Swanson L, High Resolution Focused Ion Beams: FIB and its Applications, Kluwer Academic/Plenum Publishers, NY, (2003).
-
(2003)
High Resolution Focused Ion Beams: FIB and Its Applications
-
-
Orloff, J.1
Utlaut, M.2
Swanson, L.3
-
23
-
-
0002079828
-
-
Palmer W, Wangemann K, Kampermann S, and Hosler W, Nuclear Instruments and Methods in Physics Research B 51,34 (1990).
-
(1990)
Nuclear Instruments and Methods in Physics Research B
, vol.51
, pp. 34
-
-
Palmer, W.1
Wangemann, K.2
Kampermann, S.3
Hosler, W.4
-
24
-
-
0032162412
-
Transmission electron microscope specimen preparation of zn powders using the focused ion beam lift-out technique
-
Prenitzer BI, Giannuzzi LA, Newman K, Brown SR, Irwin RB, Shofner TL, and Stevie FA, "Transmission Electron Microscope Specimen Preparation of Zn Powders Using the Focused Ion Beam Lift-Out Technique," Met. Trans. A, Vol. 29A, pp. 2399-2405. (1998).
-
(1998)
Met. Trans. A
, vol.29 A
, pp. 2399-2405
-
-
Prenitzer, B.I.1
Giannuzzi, L.A.2
Newman, K.3
Brown, S.R.4
Irwin, R.B.5
Shofner, T.L.6
Stevie, F.A.7
-
26
-
-
0036409109
-
FIB damage in silicon: Amorphization or redeposition?
-
Microscopy Society of America
-
Rajsiri S, Kempshall BW, Schwarz SM, and Giannuzzi LA, "FIB Damage in Silicon: Amorphization or Redeposition?," Microsc. and Microanal. 8 (Suppl. 2), Microscopy Society of America, 50-5 1 (2002).
-
(2002)
Microsc. and Microanal
, vol.8
, Issue.SUPPL. 2
, pp. 50-51
-
-
Rajsiri, S.1
Kempshall, B.W.2
Schwarz, S.M.3
Giannuzzi, L.A.4
-
27
-
-
0003606901
-
Sputtering by ion bombardment:Theoretical concepts, in sputtering by particle bombardment i: Physical sputtering of single element-solids
-
R. Behrisch, ed. Springer-Verlag, Berlin
-
Sigmund, P., Sputtering by Ion Bombardment:Theoretical Concepts, in Sputtering by Particle Bombardment I: Physical Sputtering of Single Element-Solids, R. Behrisch, ed., Topics in Applied Physics vol. 47 (Springer-Verlag, Berlin), (1991).
-
(1991)
Topics in Applied Physics
, vol.47
-
-
Sigmund, P.1
-
28
-
-
0022984170
-
-
Sprague JA, Malmberg PR, Reynolds GW, Lambert JM, Treado PA, and Vincenz AM, Nuclear Instruments and Methods in Physics Research B24/25, 572 (1987).
-
(1987)
Nuclear Instruments and Methods in Physics Research B24/25
, vol.572
-
-
Sprague, J.A.1
Malmberg, P.R.2
Reynolds, G.W.3
Lambert, J.M.4
Treado, P.A.5
Vincenz, A.M.6
-
29
-
-
0042369624
-
Development of a focused ion beam apparatus for preparing cross-sectional electron microscope specimens
-
Tartuani M, Takai Y, Shimizu R, Uda K, and TakahashiH, "Development of a Focused Ion Beam Apparatus for Preparing Cross-Sectional Electron Microscope Specimens," Tech. Rep. Osaka Univ., Vol. 43. No. 2143, pp. 167-73. (1993).
-
(1993)
Tech. Rep. Osaka Univ.
, vol.43
, Issue.2143
, pp. 167-173
-
-
Tartuani, M.1
Takai, Y.2
Shimizu, R.3
Uda, K.4
Takahashi, H.5
-
33
-
-
0021141145
-
Characteristics of silicon removal by fine gallium ion beam
-
Yamaguchi H, Shimase A, Haraaichi S, and Miyauchi T, " Characteristics of Silicon Removal by Fine Gallium Ion Beam," J. Vac. Sci. Technol. B3(1), pp. 71-4 (1985).
-
(1985)
J. Vac. Sci. Technol.
, vol.B3
, Issue.1
, pp. 71-74
-
-
Yamaguchi, H.1
Shimase, A.2
Haraaichi, S.3
Miyauchi, T.4
-
34
-
-
0346728134
-
-
Pergamon Press, New York
-
Zeigler JF, Biersack JP, and Littmark U, The Stopping Range of Ions in Solids, Pergamon Press, New York, (1985).
-
(1985)
The Stopping Range of Ions in Solids
-
-
Zeigler, J.F.1
Biersack, J.P.2
Littmark, U.3
-
35
-
-
84892202853
-
-
Ziegler, J.F., SRIM 2003, www.srim.org
-
(2003)
-
-
Ziegler, J.F.1
|