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Volumn 22, Issue 5, 2009, Pages 667-670

Photo-embossed surface relief structures with an increased aspect ratio by addition of kinetic interfering compounds

Author keywords

Aspect ratio; Photo embossing; RAFT agent; Relief structure

Indexed keywords

EID: 77952275900 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.22.667 Document Type: Article

Times cited : (4)

References (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.