Photo-embossed surface relief structures with an increased aspect ratios by addition of a reversible addition-fragmentation chain transfer agent

Advanced Materials

Volumn 20, Issue 16, 2008, Pages 3117-3121

  Perelaer, Jolke ^a   Hermans, Ko ^a   Bastiaansen, Cees W M ^a,c   Broer, Dirk J ^a,d   Schubert, Ulrich S ^a,b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^c QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

^d PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ABS RESINS; APPLICATIONS; DIMENSIONAL STABILITY; EARTH ATMOSPHERE; KETONES; MONOMERS; OXYGEN; PHENOLS; PHOTORESISTS; POLYMERS; PRESSURE DROP;

AMBIENT ATMOSPHERES; ATMOSPHERIC OXYGENS; BIOMEDICAL; CHAIN TRANSFER AGENTS; CHAIN TRANSFERS; HIGH ASPECT RATIOS; IMPROVEMENT FACTORS; INERT ATMOSPHERES; OPTICAL APPLICATIONS; OTHER APPLICATIONS; RAFT AGENTS; REVERSIBLE ADDITIONS; SURFACE RELIEF STRUCTURES;

ASPECT RATIO;

EID: 54949100015     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.200800124     Document Type: Article

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