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Volumn 8, Issue 2, 2006, Pages 184-191
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High-throughput screening and optimization of photoembossed relief structures
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Author keywords
[No Author keywords available]
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Indexed keywords
FLUORINE;
GLASS;
NANOMATERIAL;
ARTICLE;
AUTOMATION;
CHEMISTRY;
CONFORMATION;
METHODOLOGY;
NANOTECHNOLOGY;
AUTOMATION;
FLUORINE;
GLASS;
MOLECULAR CONFORMATION;
NANOSTRUCTURES;
NANOTECHNOLOGY;
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EID: 33645503529
PISSN: 15204766
EISSN: None
Source Type: Journal
DOI: 10.1021/cc0501108 Document Type: Article |
Times cited : (22)
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References (18)
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