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Volumn 53, Issue , 2010, Pages 266-267

A 0.29V embedded NAND-ROM in 90nm CMOS for ultra-low-voltage applications

Author keywords

[No Author keywords available]

Indexed keywords

90NM CMOS; AREA PENALTY; BIOMEDICAL APPLICATIONS; BIT LINES; CHARGE SHARING; DRIVING SOURCE; EMBEDDED ROM; LOW-VOLTAGE; LOWER-POWER CONSUMPTION; NOISE SOURCE; PRE-CHARGE; SENSING MARGIN; SMALL AREA; ULTRA-LOW-VOLTAGE;

EID: 77952228218     PISSN: 01936530     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ISSCC.2010.5433914     Document Type: Conference Paper
Times cited : (18)

References (8)
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  • 3
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    • 2 8Gb multi-level NAND Flash memory with 10MBs program throughput ," ISSCC Dig. Tech. Papers, pp. 507-516, Feb. 2006.
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    • Takeuchi, K.1
  • 4
    • 34548858947 scopus 로고    scopus 로고
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    • Feb.
    • N. Verma and A. Chandrakasan, "A 65nm 8T sub-Vt SRAM employing sense-amplifier redundancy", ISSCC Dig. Tech. Papers, pp. 328-606, Feb. 2007.
    • (2007) ISSCC Dig. Tech. Papers , pp. 328-606
    • Verma, N.1    Chandrakasan, A.2
  • 5
    • 31644438897 scopus 로고    scopus 로고
    • A full code-pattern coverage high-speed embedded ROM using dynamic virtual guardian technique
    • Feb.
    • M.-F. Chang, et al., "A full code-pattern coverage high-speed embedded ROM using dynamic virtual guardian technique," IEEE J. Solid-State Circuits, vol. 41, no. 2, pp. 496-506, Feb. 2006.
    • (2006) IEEE J. Solid-State Circuits , vol.41 , Issue.2 , pp. 496-506
    • Chang, M.-F.1
  • 6
    • 0032625431 scopus 로고    scopus 로고
    • A negative Vth cell architecture for highly scalable, excellently noise-immune, and highly reliable NAND Flash memories
    • May
    • K. Takeuchi, et al., "A negative Vth cell architecture for highly scalable, excellently noise-immune, and highly reliable NAND Flash memories," IEEE J. Solid-State Circuits, vol. 34, no. 5, pp. 675-684, May 1999.
    • (1999) IEEE J. Solid-State Circuits , vol.34 , Issue.5 , pp. 675-684
    • Takeuchi, K.1
  • 7
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    • 0.13 μm MONOS single transistor memory cell with separated source lines
    • Dec.
    • I. Fujiwara, H. Aozasa, A. Nakamura, Y. Komatsu, and Y. Hayashi, "0.13 μm MONOS single transistor memory cell with separated source lines," IEDM, pp. 995-998, Dec. 1998.
    • (1998) IEDM , pp. 995-998
    • Fujiwara, I.1    Aozasa, H.2    Nakamura, A.3    Komatsu, Y.4    Hayashi, Y.5
  • 8
    • 49549103577 scopus 로고    scopus 로고
    • A 32kb 10T subthreshold SRAM array with bit-interleaving and differential read scheme in 90nm CMOS
    • Feb.
    • I. J. Chang, J. J. Kim, S. P. Park and K. Roy, "A 32kb 10T subthreshold SRAM array with bit-interleaving and differential read scheme in 90nm CMOS", ISSCC Dig. Tech. Papers, pp. 388-622, Feb. 2008.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.