Scanner fleet management utilizing programmed hotspot patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Yoshida, Kenji ^a   Inoue, Soichi ^b   Hashimoto, Koji ^b   Tanaka, Satoshi ^b   Satake, Masaki ^b   Obara, Takashi ^b   Takahata, Kazuhiro ^b   Yamanaka, Eiji ^b   Kariya, Mitsuyo ^b   Morinaga, Hiroyuki ^b   Mimotogi, Shoji ^b  

^a TOSHIBA CORPORATION   (Japan)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER NETWORKS; COST EFFECTIVENESS; FLEET OPERATIONS; INSPECTION; MANAGEMENT; MASKS; MONITORING; MULTITASKING; NUMERICAL METHODS; OPTICS; SCANNING; SODIUM; TECHNOLOGY; TECHNOLOGY TRANSFER; TESTING;

ABERRATION MONITORING; CIRCUIT RELIABILITY; CRITICAL PARAMETERS; DEPTH-OF-FOCUS (DOF); FLEET CONTROL; FLEET MANAGEMENT; HIGH PRODUCTIVITY; HOT SPOTTING; HOT-SPOTS; INSPECTION SYSTEMS; LITHOGRAPHY PROCESS MONITOR; MASK TECHNOLOGY; MONITOR (CO); NEXT-GENERATION LITHOGRAPHY (NGL); NUMERICAL APERTURE (NA); PATTERN SHAPE; PHOTO MASKING; SIMULATION DATA; WAFER FABRICATIONS; WAFER PROCESSING;

QUALITY CONTROL;

EID: 45549091651     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793038     Document Type: Conference Paper

References (4)

1. Mitsuyo Kariya et al., "Reticle SEM specification required for lithography simulation", SPIE Vol.5853, p550-2005
2. Mitsuyo Kariya et al., "Mask Pattern Quality Assurance based on Lithography Simulation with Fine Pixel SEM Images", SPIE Vol.5992, 5992-59, 2005
3. Eiji Yamanaka et al., "Fine pixel SEM image for mask pattern quality assurance based on lithography simulation", SPIE Vol.6283, 62832E-1, 2006
4. Kenji Yoshida et al., "Virtual lithography system to improve the productivity of high-mix / low-volume production", PMJ Vol.6607-54, 2007