Characterization of NiO films with the process variables in the RF-sputtering

Journal of Korean Institute of Metals and Materials

Volumn 48, Issue 4, 2010, Pages 320-325

  Chung, Kook Chae ^a   Kim, Young Kuk ^a   Choi, Chul Jin ^a  

^a Korea Institute of Material Science   (South Korea)

Author keywords

AFM; Electrical properties; Optoelectronic materials; Resistivity; Sputtering

Indexed keywords

EID: 77951604617     PISSN: 17388228     EISSN: None     Source Type: Journal    
DOI: 10.3365/KJMM.2010.48.04.320     Document Type: Article

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