BaTiO3-related ferroelectric thin films by polymer assisted deposition

Integrated Ferroelectrics

Volumn 100, Issue 1, 2008, Pages 132-139

  Jain, M ^a   Bauer, E ^b   Lin, Y ^c   Wang, H ^d   Burrell, A K ^b   McClesky, T M ^b   Jia, Q X ^b  

^a UNIVERSITY OF CONNECTICUT   (United States)

^b LOS ALAMOS NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^d Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BA0.7SR0.3; BST FILM; BULK-LIKE; CUBIC PHASIS; DIELECTRIC TUNABILITY; LATTICE PARAMETERS; POLYMER-ASSISTED DEPOSITION; RELAXORS; ROOM TEMPERATURE; TIO;

BARIUM; BARIUM COMPOUNDS; DEPOSITION; DIELECTRIC PROPERTIES; EPITAXIAL FILMS; FERROELECTRIC FILMS; FERROELECTRIC MATERIALS; FERROELECTRIC THIN FILMS; PULSED LASER DEPOSITION; PULSED LASERS; ZIRCONIUM;

POLYMER FILMS;

EID: 77951485337     PISSN: 10584587     EISSN: 16078489     Source Type: Journal    
DOI: 10.1080/10584580802540645     Document Type: Conference Paper

References (19)

1. A.K Tagantsev, V.O. Sherman, K.F. Astafiev, J. Venkatesh, and N. Setter, J. of Electroceramics 11, 5 (2003).
2. J.F. Scott, Jpn. J. Appl. Phys. 38, 2272 (1999).
3. M. Jain, S.B.Majumder, R.S. Katiyar, A.S. Bhalla, F.A.Miranda, and F.W. Van Keuls, Ferroelectrics Letters 30, 99 (2003).
4. U. Welber, G. Greuel, U. Boettger, S. Weber, D. Hennings, and R. Waser, J. Am. Ceram Soc. 84, 759 (2001).
5. C.W. Nan, M.I. Bichurin, S. Dong, D. Viehland, and G. Srinivasan, J. Appl. Phys. 103, 031101 (2008).
6. M. Jain, S.B.Majumder, R.S. Katiyar, A.S. Bhalla, F.A.Miranda, and F.W. Van Keuls, Applied Physics A A80, 645 (2005)
7. T. Maiti, R. Guo, and A.S. Bhalla, J. Appl. Phys. 100, 114109 (2006).
8. Y. Zhi, R. Guo, and A.S. Bhalla, Appl. Phys. Lett. 77, 1535 (2000).
9. F. Zimmermann, M. Voigts,W.Menesklou, E. Ivers-Tiffe'e, Journal of the European Ceramic Society 24, 1729 (2004).
10. Z. Jiwei, Y. Xi, S. Bo, Z. Liangying, and H. Chen, Journal of Electroceramics 11, 157 (2003).
11. R. Pantou, C. Dubourdieu, F. Weiss, J. Kreisel, G. Köbernik, and W. Haessler, Mat. Sci. Semiconductor Processing 5, 237 (2003).
12. M. Jain, E. Bauer, F. Ronning, M.F. Hundley, L. Civale, H. Wang, B. Maiorov, A.K. Burrell, T.M. McClesky, S.R. Foltyn, R.F. DePaula, and Q.X. Jia, J. Am. Ceram. Soc. 91, 1858 (2008).
13. Q.X. Jia, T.M. McCleskey, A.K. Burrell, Y. Lin , G.E. Collis, H. Wang, A.D.Q Li, and S.R. Foltyn, Nat. Mater. 3, 529 (2004).
14. M. MacQuarrie, J. Am. Ceram. Soc. 38, 444 (1955).
15. Y. Gim, T. Hudson, Y. Fan, C. Cwon, A.T. Findikoglu, B.J. Gibbons, B.H. Park, and Q.X. Jia, Appl. Phys. Lett. 77, 1200 (2000).
16. G. Ghione, IEEE Trans. Microwave Theory Tech. 41, 1499 (1993).
17. H. Vogel, Z. Phys. 22, 645 (1921);
18. G. Fulcher, J. Am. Ceram. Soc. 8, 339 (1925).
19. K. Uchino and S. Nomura, Ferroelectrics 44, 55 (1982).