Measurement of arsenic and gallium content of gallium arsenide semiconductor waste streams by ICP-MS

Journal of Environmental Science and Health - Part A Toxic/Hazardous Substances and Environmental Engineering

Volumn 45, Issue 4, 2010, Pages 471-475

  Torrance, Keith W ^a   Keenan, Helen E ^a   Hursthouse, Andrew S ^b   Stirling, David ^b  

^a UNIVERSITY OF STRATHCLYDE   (United Kingdom)

^b UNIVERSITY OF THE WEST OF SCOTLAND   (United Kingdom)

Author keywords

Environmental issues; Gallium arsenide; ICP MS; Lapping waste; Polishing waste; Semiconductor; Sustainability

Indexed keywords

ARSENIC CONTENT; ARSENIC LEVELS; ENVIRONMENTAL ISSUES; GAAS; HAZARDOUS WASTES; ICP-MS; INDUSTRIAL SOURCES; LABORATORY CONDITIONS; LIQUID WASTES; MANUFACTURING PROCESS; PROCESSING WASTES; SEMI-CONDUCTOR WAFER; SEMICONDUCTOR DEVICE FABRICATION; SOLIDS CONTENT; SUSTAINABLE MANUFACTURING; WAFER POLISHING; WAFER PROCESSING; WAFER-THINNING PROCESS; WASTE SLURRIES; WASTE STREAM;

ARSENIC; DISSOLUTION; ELECTROMAGNETIC INDUCTION; ENVIRONMENTAL IMPACT; ENVIRONMENTAL PROTECTION; GALLIUM ALLOYS; HAZARDOUS MATERIALS; HEAVY METALS; INDUCTIVELY COUPLED PLASMA; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; LAPPING; MASS SPECTROMETERS; METAL RECOVERY; POLISHING; SEMICONDUCTING GALLIUM; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; SUSTAINABLE DEVELOPMENT; WASTE DISPOSAL; WASTE TREATMENT;

GALLIUM ARSENIDE;

ARSENIC; GALLIUM; GALLIUM ARSENIDE; HEAVY METAL;

ARTICLE; CHEMISTRY; ECONOMIC ASPECT; ENVIRONMENTAL IMPACT; HAZARDOUS WASTE; INDUSTRY; MASS SPECTROMETRY; MEASUREMENT; POLLUTION; RECYCLING; SEMICONDUCTOR; STREAM (RIVER); WASTE DISPOSAL; WASTE WATER;

ARSENIC; GALLIUM; MASS SPECTROMETRY; MICROSCOPY, ELECTRON, SCANNING; SEMICONDUCTORS;

EID: 77951210960     PISSN: 10934529     EISSN: 15324117     Source Type: Journal    
DOI: 10.1080/10934520903540133     Document Type: Article

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