Pulsed-laser deposition of ZnO thin-films on MgO substrates

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 10, 2008, Pages 3288-3292

  Friedrich, F ^a   Sieber, I ^a   Klaus, M ^a   Genzel, Ch ^a   Nickel, N H ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ZNO; DEPOSITION TEMPERATURES; FILM STRUCTURE; HIGH QUALITY; LASER DEPOSITION TECHNIQUE; MAGNESIUM OXIDES; MGO SUBSTRATE; MGO SURFACES; PHONON MODE; TEMPERATURE RANGE; THIN FILM FORMATION; ZNO;

FILM GROWTH; GROWTH TEMPERATURE; MAGNESIUM; OXIDE FILMS; PHOTODEGRADATION; PULSED LASER DEPOSITION; PULSED LASERS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR GROWTH; SEMICONDUCTOR SWITCHES; TECHNICAL PRESENTATIONS; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

SEMICONDUCTOR LASERS;

EID: 77951194601     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200779520     Document Type: Conference Paper

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