Wide-range control of tunnel resistance on metallic nanogaps using migration

Journal of Physics: Conference Series

Volumn 100, Issue PART 5, 2008, Pages

  Kayashima, S ^a   Takahashi, K ^a   Motoyama, M ^a   Shirakashi, J ^a  

^a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES;

APPLIED CURRENT; APPLIED VOLTAGES; FABRICATION PROCESS; FIELD EMISSION CURRENTS; NANOGAP ELECTRODES; NANOGAPS; TUNNEL RESISTANCE; TUNNELING DEVICE;

NANOSTRUCTURES;

EID: 77950967407     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/100/5/052022     Document Type: Conference Paper

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