Pressure and stress effects on diffusion in Si

Defect and Diffusion Forum

Volumn 153-155, Issue , 1998, Pages 1-10

  Aziz, M J ^a  

^a HARVARD UNIVERSITY   (United States)

Author keywords

Antimony; Arsenic; Biaxial Stress; Boron; Diffusion Mechanism; Dopant Diffusion; Germanium; Nonhydrostatic Stress; Self Diffusion; Silicon; Thermodynamics

Indexed keywords

ANTIMONY; ARSENIC; BORON; CALCULATIONS; GERMANIUM; HYDRAULICS; HYDROSTATIC PRESSURE; POINT DEFECTS; SILICON; SINGLE CRYSTALS; THERMODYNAMICS;

BIAXIAL STRESS; DIFFUSION MECHANISMS; DOPANT DIFFUSION; NONHYDROSTATIC STRESS; SELF-DIFFUSION;

DIFFUSION;

EID: 77950580260     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.153-155.1     Document Type: Article

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