Finite element method as applied to the study of gratings embedded in complementary metal-oxide semiconductor image sensors

Optical Engineering

Volumn 48, Issue 5, 2009, Pages

  Demésy, Guillaume ^a,b   Zolla, Frédéric ^a   Nicolet, André ^a   Commandré, Mireille ^a   Fossati, Caroline ^a   Gagliano, Olivier ^b   Ricq, Stéphane ^b   Dunne, Brendan ^b  

^a AIX MARSEILLE UNIVERSITÉ   (France)

^b STMICROELECTRONICS   (France)

Author keywords

complementary metal oxide semiconductor (CMOS); finite element method (FEM); grating filter; image sensors; subwavelength structures

Indexed keywords

COMPLEMENTARY METAL OXIDE SEMICONDUCTORS; DIFFRACTED FIELD; DIFFRACTIVE PATTERNS; FINITE ELEMENT METHOD (FEM); GRATING FILTER; MAXWELL'S EQUATIONS; NUMBER OF LAYERS; OPTICAL BENCH; RIGOROUS SOLUTION; SPECTRAL FILTERS; SPECTRAL RESPONSE; SUB-WAVELENGTH; SUB-WAVELENGTH STRUCTURES; TRANSVERSE ELECTRICS; TRANSVERSE MAGNETIC POLARIZATION;

ELECTROMAGNETISM; IMAGE SENSORS; MATERIALS PROPERTIES; MAXWELL EQUATIONS; SENSORS;

FINITE ELEMENT METHOD;

EID: 77950442327     PISSN: 00913286     EISSN: 15602303     Source Type: Journal    
DOI: 10.1117/1.3139291     Document Type: Article

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