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Volumn 48, Issue 9 Part 2, 2009, Pages

Optical properties of BiFeO3-system multiferroic thin films

(10) Shima, Hiromi a Kawae, Takeshi b Morimoto, Akiharu b Matsuda, Masahiro c Suzuki, Michio c Tadokoro, Toshiyasu d Naganuma, Hiroshi e Iijima, Takashi f Nakajima, Takashi a Okamura, Soichiro a

a TOKYO UNIVERSITY OF SCIENCE (Japan)

b KANAZAWA UNIVERSITY (Japan)

c J A Woollam Japan Corporation (Japan)

d Techno Synergy Inc (Japan)

e TOHOKU UNIVERSITY (Japan)

f NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

1550 NM; AT-WAVELENGTH; BAND GAPS; BFO FILMS; CHEMICAL SOLUTION DEPOSITION; EXTINCTION COEFFICIENTS; HIGH POTENTIAL; HIGH REFRACTIVE INDEX; MULTIFERROIC FILM; MULTIFERROIC THIN FILMS; REFRACTIVE INDEX GRADIENTS;

ENERGY GAP; LIGHT REFRACTION; MANGANESE; MANGANESE COMPOUNDS; OPTICAL CONSTANTS; PULSED LASER DEPOSITION; PULSED LASERS; REFRACTIVE INDEX; REFRACTOMETERS; SPECTROSCOPIC ELLIPSOMETRY;

OPTICAL COMMUNICATION;

EID: 77950364149 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.48.09KB01 Document Type: Article

Times cited : (12)

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