On the geometry control of magnetic devices: Impact of photo-resist profile, shadowing effect, and material properties

Vacuum

Volumn 84, Issue 9, 2010, Pages 1075-1079

  Peng, Xilin ^a   Wang, Zhongyan ^a   Lu, Yongxiong ^b   Lafferty, Brendan ^b   McLaughlin, Thomas ^b   Ostrowski, Mark ^a  

^a SEAGATE TECHNOLOGY   (United States)

^b SEAGATE TECHNOLOGY   (United Kingdom)

Author keywords

Geometry control; Ion beam etching; Magnetic materials; Shadowing effect

Indexed keywords

CRITICAL DIMENSION; DEVICE PERFORMANCE; DEVICE PROFILE; ION BEAM ETCHING; ION BEAM MILLING; MATERIAL PROPERTY; RESIST PROFILE; SHADOWING EFFECTS; STANDING WAVE;

ETCHING; ION BEAMS; IONS; MAGNETIC DEVICES; MAGNETIC MATERIALS;

COMPUTATIONAL GEOMETRY;

EID: 77950297411     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.01.029     Document Type: Article

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