High performance metal/insulator/metal capacitors using HfTiO as dielectric

International Symposium on VLSI Technology, Systems, and Applications, Proceedings

Volumn , Issue , 2009, Pages 67-68

  Hsu, Hsiao Hsuan ^a   Cheng, Chun Hu ^a   Tsui, Bing Yue ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE DENSITY; HAFNIUM TITANATE; HIGH-CAPACITANCE DENSITY; LOW-LEAKAGE CURRENT; MIM CAPACITORS; ORDERS OF MAGNITUDE; PLASMA TREATMENT; VOLTAGE COEFFICIENT OF CAPACITANCES;

CAPACITORS; HAFNIUM; HAFNIUM COMPOUNDS; MIM DEVICES; PLASMA APPLICATIONS; SECURITY SYSTEMS;

CAPACITANCE;

EID: 77950169035     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VTSA.2009.5159294     Document Type: Conference Paper

References (6)

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