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Volumn 1, Issue , 2009, Pages 223-226

Integrated micro heat sink based on microchannels microfabricated onto silicon

Author keywords

Characterization; Cooling; Microprocessing; Surface; Test structure

Indexed keywords

CU THIN FILM; ELECTRICAL CHARACTERIZATION; FORCED COOLING; INTEGRATED MICROSYSTEMS; MICRO HEAT SINK; MICRO PROCESSING; MICRO-FABRICATION TECHNIQUES; MICRO-FLUIDIC DEVICES; MICROFABRICATED; POWER RESISTANCE; POWER SEMICONDUCTOR DEVICES; SACRIFICIAL LAYER; SILICON SURFACES; SURFACE TEST; TEST STRUCTURE; THICK RESIST;

EID: 77950151565     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/SMICND.2009.5336565     Document Type: Conference Paper
Times cited : (1)

References (10)
  • 2
    • 33751511909 scopus 로고
    • High Power Semiconductor Device with Integral Heat Sink
    • U.S. Patent #5,057,908
    • R.J. Weber, "High Power Semiconductor Device with Integral Heat Sink", U.S. Patent #5,057,908, 1991.
    • (1991)
    • Weber, R.J.1
  • 3
    • 0027099346 scopus 로고
    • High Aspect Ratio Electroplated Microstructures Using a Photosensitive Polymide Process
    • Travemunde, Germany, Feb
    • A.B. Frazier and M.G. Allen, "High Aspect Ratio Electroplated Microstructures Using a Photosensitive Polymide Process", Proc. Of Micro Electro Mechanical Systems Workshop, Travemunde, Germany, Feb. 1992, pp. 87-92.
    • (1992) Proc. Of Micro Electro Mechanical Systems Workshop , pp. 87-92
    • Frazier, A.B.1    Allen, M.G.2
  • 4
    • 0001968438 scopus 로고
    • The Composition of Thin Electrodeposited Alloy Films with Special Reference to Nickel-Iron
    • M.E. Henstock and E.S. Spencer-Timms, "The Composition of Thin Electrodeposited Alloy Films with Special Reference to Nickel-Iron", Trans. Institute of Metal Finishing, Vol. 40, 1963, pp. 179-185.
    • (1963) Trans. Institute of Metal Finishing , vol.40 , pp. 179-185
    • Henstock, M.E.1    Spencer-Timms, E.S.2
  • 6
    • 0026840123 scopus 로고    scopus 로고
    • High Depth to Width Aspect Ratios in Thick Positive Photoresist Layers Using Near UV Lithography
    • G. Engelmann, and H. Reichl, "High Depth to Width Aspect Ratios in Thick Positive Photoresist Layers Using Near UV Lithography", Microelectronic Engineering;
    • Microelectronic Engineering
    • Engelmann, G.1    Reichl, H.2
  • 7
    • 0029191566 scopus 로고    scopus 로고
    • Youngcheol Joo, Kiet Dieu, and Chang-Jin Kim, Fabrication of monolithic microchannels for IC chip cooling, Mechanical, Aerospace and Nuclear Engineering Dept., Univ. of California, L. A., IEEE 0-7803-2503-6, 1995, pp. 362-367.
    • Youngcheol Joo, Kiet Dieu, and Chang-Jin Kim, "Fabrication of monolithic microchannels for IC chip cooling", Mechanical, Aerospace and Nuclear Engineering Dept., Univ. of California, L. A., IEEE 0-7803-2503-6, 1995, pp. 362-367.
  • 8
    • 0003771309 scopus 로고
    • Heat-Transfer Micro-structures for Integrated Circuits
    • Ph. D. Dissertation, Stanford University
    • D.B. Tuckerman, "Heat-Transfer Micro-structures for Integrated Circuits", Ph. D. Dissertation, Stanford University, 1984.
    • (1984)
    • Tuckerman, D.B.1
  • 9
    • 9644258508 scopus 로고
    • Cathode Films in Electro-deposition
    • Electroplaters' Soc
    • A. Brenner, "Cathode Films in Electro-deposition", Proc. Amer. Electroplaters' Soc., Vol. 28, 1941, pp. 28-35.
    • (1941) Proc. Amer , vol.28 , pp. 28-35
    • Brenner, A.1
  • 10
    • 48549097713 scopus 로고    scopus 로고
    • A. Coraci & all Technological methods for low temperature micro-fluidic devices micro-fabrication, IEEE International Semiconductor Conference 2007, Sinaia 15-17 Oct, Proceeding CAS 2007, 1, pp. 107-110.
    • A. Coraci & all "Technological methods for low temperature micro-fluidic devices micro-fabrication", IEEE International Semiconductor Conference 2007, Sinaia 15-17 Oct, Proceeding CAS 2007, Vol 1, pp. 107-110.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.