SCOPUS 정보 검색 플랫폼

Volumn 17, Issue 1-4, 1992, Pages 303-306

High depth to width aspect ratios in thick positive photoresist layers using near UV lithography

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; PHOTORESISTS - OPTICAL PROPERTIES; ULTRAVIOLET RADIATION - APPLICATIONS;

ASPECT RATIOS; MASK STRUCTURES; NEAR UV LITHOGRAPHY; THICK POSITIVE PHOTORESISTS;

INTEGRATED CIRCUITS;

EID: 0026840123 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/0167-9317(92)90062-V Document Type: Article

Times cited : (23)

References (7)

1
- 0042285052
- H. Reichl, Springer, Berlin
- (1990) Micro System Technologies , vol.90 , pp. 435
- Engelmann¹ Ehrmann² Simon³ Reichl⁴

3
- 84914943017
- B. Wagner, M. Kreuzer and W. Benecke, Proc. Transducers '91, San Francisco, p. 614.

4
- 84914899783
- J. Simon, G. Engelmann, O. Ehrmann and H. Reichl, to be published at 2nd Int. Conf. Micro System Technologies 91.

5
- 84914932448
- R. Jurisch, P. Peitsch, O. Brodersen and J. Simon, to be published at 2nd Int. Conf. Micro System Technologies 91.

6
- 84914903699
- Cleveland, to be published in Sensors and Actuators, Chemical B
- (1990) Proc. 3rd Int. Meeting on Chemical Sensors , pp. P-87
- Lin¹ Möller² Obermeier³

7
- 0000776916
- H. Reichl, Springer, Berlin
- (1990) Micro System Technologies , vol.90 , pp. 529
- Mohr¹ Burbaum² Bley³ Menz⁴ Wallrabe⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.