Vertically aligned liquid crystals on tantalum oxide thin films using ion beam irradiation processing

Journal of the Electrochemical Society

Volumn 157, Issue 4, 2010, Pages

  Lee, Jin Woo ^a   Lim, Ji Hun ^b   Oh, Byeong Yun ^b   Kim, Young Hwan ^b   Park, Hong Gyu ^b   Kim, Byoung Yong ^b   Hwang, Jeong Yeon ^b   Ok, Chul Ho ^b   Moon, Byung Moo ^a   Seo, Dae Shik ^b  

^a Korea University   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC SURFACE ENERGY; DIPOLE-DIPOLE; EXPOSURE-TIME; ION BEAM IRRADIATION; IRRADIATION TIME; LC ALIGNMENT; PEAK SHIFT; SURFACE ENERGIES; VERTICALLY ALIGNED;

ALIGNMENT; ANISOTROPY; CONTACT ANGLE; CRYSTAL ORIENTATION; INTERFACIAL ENERGY; ION BEAMS; IRRADIATION; LIQUID CRYSTALS; OXIDE FILMS; SURFACE CHEMISTRY; SURFACE TENSION; TANTALUM; TANTALUM OXIDES;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 77949699128     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.3295696     Document Type: Article

References (19)

1. H. Matsuda, D. S. Seo, N. Yoshida, K. Fujibayashi, and S. Kobayashi, Mol. Cryst. Liq. Cryst. Sci. Technol., Sect. A 1058-725X, 264, 23 (1995). 10.1080/10587259508037298
2. B. Park, K. -J. Han, Y. Jung, H. -H. Choi, H. -K. Hwang, S. Lee, S. -H. Jang, and H. Takezoe, J. Appl. Phys. 0021-8979, 86, 1854 (1999). 10.1063/1.370979
3. C. J. Newsome and M. O'Neill, J. Appl. Phys. 0021-8979, 92, 1752 (2002). 10.1063/1.1492863
4. S. Varghese, S. Narayanankutty, C. W. M. Bastiaansen, G. P. Crawford, and D. J. Broer, Adv. Mater. (Weinheim, Ger.) 0935-9648, 16, 1600 (2004). 10.1002/adma.200306536
5. S. Park, C. Padeste, H. Schift, J. Gobrecht, and T. Scharf, Adv. Mater. (Weinheim, Ger.) 0935-9648, 17, 1398 (2005). 10.1002/adma.200400989
6. F. S. Yeung, J. Y. Ho, Y. W. Li, F. C. Xie, O. K. Tsui, P. Sheng, and H. S. Kwok, Appl. Phys. Lett. 0003-6951, 88, 051910 (2006). 10.1063/1.2171491
7. J. H. Lim, B. Y. Oh, W. K. Lee, K. M. Lee, H. J. Na, B. Y. Kim, D. S. Seo, J. M. Han, and J. Y. Hwang, Appl. Phys. Lett. 0003-6951, 95, 123503 (2009). 10.1063/1.3232239
8. H. G. Park, Y. H. Kim, B. Y. Oh, W. K. Lee, B. Y. Kim, J. Y. Hwang, and D. S. Seo, Appl. Phys. Lett. 0003-6951, 93, 233507 (2008). 10.1063/1.3046728
9. J. Y. Kim, B. Y. Oh, B. Y. Kim, Y. H. Kim, J. W. Han, J. M. Han, and D. S. Seo, Appl. Phys. Lett. 0003-6951, 92, 043505 (2008). 10.1063/1.2838312
10. P. Chaudhari, J. Lacey, J. Doyle, E. Galligan, S. -C. A. Lien, A. Callegari, G. Houghham, N. D. Lang, P. S. Andry, R. John, Nature (London) 0028-0836, 411, 56 (2001). 10.1038/35075021
11. J. Stohr, M. G. Samant, J. Luning, A. C. Callegari, P. Chaudhari, J. P. Doyle, J. A. Lacey, S. A. Lien, S. Purushothaman, and J. L. Speidell, Science 0036-8075, 292, 2299 (2001). 10.1126/science.1059866
12. W. -K. Lee, B. -Y. Oh, J. -H. Lim, H. -G. Park, B. -Y. Kim, H. -J. Na, and D. S. Seo, Appl. Phys. Lett. 0003-6951, 94, 223507 (2009). 10.1063/1.3126961
13. J. H. Lim, B. Y. Oh, B. Y. Kim, Y. H. Kim, K. M. Lee, J. M. Han, S. K. Lee, and D. S. Seo, J. Appl. Phys. 0021-8979, 105, 014504 (2009). 10.1063/1.3013434
14. Y. -H. Kim, J. -H. Lim, B. -Y. Oh, B. -Y. Kim, J. -M. Han, J. -Y. Hwang, and D. S. Seo, J. Electrochem. Soc. 0013-4651, 156, J134 (2009). 10.1149/1.3106142
15. B. -Y. Oh, J. -H. Lim, K. -M. Lee, Y. -H. Kim, B. -Y. Kim, J. -M. Han, S. -K. Lee, D. S. Seo, and J. -Y. Hwang, Electrochem. Solid-State Lett. 1099-0062, 11, H331 (2008). 10.1149/1.2990221
16. M. Jiao, Z. Ge, Q. Song, and S. T. Wu, Appl. Phys. Lett. 0003-6951, 92, 061102 (2008). 10.1063/1.2841642
17. G. Gerdin, W. Stygar, and F. Venneri, J. Appl. Phys. 0021-8979, 52, 3269 (1981). 10.1063/1.329145
18. http://www.autronic-melchers.com/index.php?product-59, last accessed Feb 2010.
19. Y. Hwang, Y. M. Jo, D. S. Seo, S. J. Rho, D. K. Lee, and H. K. Baik, Jpn. J. Appl. Phys., Part 2 0021-4922, 41, L654 (2002). 10.1143/JJAP.41.L654