Anisotropy of domain growth in epitaxial ferroelectric capacitors

Applied Physics Letters

Volumn 96, Issue 11, 2010, Pages

  Wu, D ^a   Vrejoiu, I ^b   Alexe, M ^b   Gruverman, A ^c  

^a NORTH CAROLINA STATE UNIVERSITY   (United States)

^b MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^c UNIVERSITY OF NEBRASKA LINCOLN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC GROWTH; DOMAIN GROWTH; DOMAIN GROWTH KINETICS; EPITAXIAL FERROELECTRIC; EXPERIMENTAL DATA; FILM MICROSTRUCTURES; HIGH FIELD; INTEGER VALUES; ISOTROPIC GROWTH; KOLMOGOROV; LOW FIELD; LOW-TO-HIGH; MICRO-SCALES; PB(ZR ,TI)O; PIEZORESPONSE FORCE MICROSCOPY; QUALITATIVE CHANGES; SWITCHING KINETICS;

ACTIVATION ENERGY; ANISOTROPY; CAPACITANCE; CAPACITORS; COMPUTATIONAL COMPLEXITY; FILM GROWTH; LEAD; ZIRCONIUM;

GROWTH KINETICS;

EID: 77949689246     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3366724     Document Type: Article

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