Far-field polarization-based sensitivity to subresolution displacements of a sub-resolution scatterer in tightly focused fields

Optics Express

Volumn 18, Issue 6, 2010, Pages 5609-5628

  Rodríguez Herrera, Oscar G ^a   Lara, David ^b   Dainty, Chris ^a  

^a NATIONAL UNIVERSITY OF IRELAND   (Ireland)

^b IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC FIELDS; NUMERICAL ANALYSIS; POLARIZATION;

EXIT PUPIL; EXPERIMENTAL EVIDENCE; FAR-FIELD; FOCUSED FIELDS; HIGH NUMERICAL APERTURES; NUMERICAL RESULTS; POLARIZATION STATE; SUBRESOLUTION; SUBRESOLUTION SCATTERER;

SCATTERING;

ARTICLE; EQUIPMENT; INSTRUMENTATION; LIGHT; OPTICAL INSTRUMENTATION; RADIATION SCATTERING; REFRACTOMETRY;

EQUIPMENT FAILURE ANALYSIS; LENSES; LIGHT; REFRACTOMETRY; SCATTERING, RADIATION;

EID: 77949575795     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.005609     Document Type: Article

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