Mueller polarimetry in the back focal plane

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  De Martino, A ^a   Ben Hatit, S ^a   Foldyna, M ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

Calibration; Conical diffraction; Ellipsometry; Mueller matrix; Polarimetry

Indexed keywords

ANGLE MEASUREMENT; DIFFRACTION GRATINGS; MICROSCOPES; NEMATIC LIQUID CRYSTALS; POLARIZATION;

AZIMUTHAL ANGLES; CONICAL DIFFRACTION MOUNTING; MUELLER MATRICES;

POLARIMETERS;

EID: 35148881131     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.708627     Document Type: Conference Paper

References (15)

1. B. K. Minhas, S. A. Coulombe, S. Sohail, H. Naqvi, and J. R. McNeil, "Ellipsometric scatterometry for the metrology of sub-0.1-μm-linewidth structures," Appl. Opt. 37, 5112-5115 (1998).
2. H.-T. Huang and F. L. Terry, Jr., Erratum to "Spectroscopic ellipsometry and reflectometry from grating (scatterometry) for critical dimension measurement and in situ, real-time process monitoring," [Thin Solid Films 455-456, 828-836 (2004)],
3. Thin Solid Films 486, 339-346 (2004).
4. nd ed. (North-Holland, 1986).
5. T. Novikova, A. De Martino, S. Ben Hatit, and B. Drévillon, "Application of Mueller polarimetry in conical diffraction for critical dimension measurement in microelectronics," Appl. Opt. 45, 3688-3697 (2006).
6. T. Novikova, A. De Martino, R. Ossikovski, and B. Drévillon, "Metrological applications of Mueller polarimetry in conical diffraction for overlay characterization in microelectronics,", Eur. Phys. J. Appl. Phys. 31, 69-69 (2005).
7. E. Garcia-Caurel, A. De Martino, and B. Drévillon, "Spectroscopic Mueller Polarimeter based on liquid crystal devices," Thin Solid Films, 455-456, 120-123 (2004).
8. A. De Martino, Y.-K. Kim, E. Garcia-Caurel, B. Laude, and B. Drévillon, "Optimized Mueller polarimeter with liquid crystals", Opt. Lett. 28, 616-618 (2003).
9. T. J. Fellers and M. W. Davidson, http://www.microscopyu.com/articles/ formulas/formulasconjugate.html
10. E. Compain, S. Poirier, and B. Drévillon, "General and self-consistent method for the calibration of polarization modulators, polarimeters and Mueller-matrix ellipsometers," Appl. Opt. 38, 3490-3502 (1999).
11. D. L. Saucedo, Three-dimensional complete polarization sensitive imaging using a confocal Mueller matrix polarimeter, Ph.D. dissertation, Imperial College London (2005).
12. S. -Y. Lu and R. A. Chipman, "Interpretation of Mueller matrices based on polar decomposition," J. Opt. Soc. Am. A 13, 1106-1113 (1996).
13. M. G. Moharam, E. B. Grann, D. A. Pommet, and T. K. Gaylord, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068-1076 (1995).
14. L. Li, "Formulation and comparison of two recursive matrix algorithms for modeling layered diffraction gratings," J. Opt. Soc. Am. A 13, 1024-1035 (1996).
15. M. G. Moharam, D. A. Pommet, E. B. Grann, and T. K. Gaylord, "Stable implementation of the rigorous coupled-wave analysis for surface-relief gratings: enhanced transmittance matrix approach," J. Opt. Soc. Am. A 12, 1077-1086 (1995).