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Volumn 21, Issue 1, 2010, Pages 33-37

Microstructure and properties of Al-doped ZnO thin films by nonreactive DC magnetron sputtering at room temperature following rapid thermal annealing

Author keywords

[No Author keywords available]

Indexed keywords

AL CONTENT; AL-DOPED ZNO; AL-DOPING; ANNEALING TEMPERATURES; AZO FILMS; AZO THIN FILMS; DC MAGNETRON SPUTTERING; ELECTRICAL RESISTIVITY; GRAIN SIZE; MICROSTRUCTURE AND PROPERTIES; OPTICAL TRANSMITTANCE; OPTICAL TRANSPORT PROPERTIES; ROOM TEMPERATURE; SPUTTERING POWER;

EID: 77949425005     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-009-9865-8     Document Type: Article
Times cited : (12)

References (10)
  • 2
    • 18244431984 scopus 로고    scopus 로고
    • doi: 10.1016/S0040-6090(02)00655-7
    • T. Yamamoto, Thin Solid Films. 420-421, 100 (2002). doi: 10.1016/S0040-6090(02)00655-7
    • (2002) Thin Solid Films. , vol.420-421 , pp. 100
    • Yamamoto, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.