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Volumn 21, Issue 1, 2010, Pages 33-37
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Microstructure and properties of Al-doped ZnO thin films by nonreactive DC magnetron sputtering at room temperature following rapid thermal annealing
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Author keywords
[No Author keywords available]
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Indexed keywords
AL CONTENT;
AL-DOPED ZNO;
AL-DOPING;
ANNEALING TEMPERATURES;
AZO FILMS;
AZO THIN FILMS;
DC MAGNETRON SPUTTERING;
ELECTRICAL RESISTIVITY;
GRAIN SIZE;
MICROSTRUCTURE AND PROPERTIES;
OPTICAL TRANSMITTANCE;
OPTICAL TRANSPORT PROPERTIES;
ROOM TEMPERATURE;
SPUTTERING POWER;
DOPING (ADDITIVES);
ELECTRIC CONDUCTIVITY;
MAGNETRONS;
MICROSTRUCTURE;
OPTICAL FILMS;
OPTICAL PROPERTIES;
RAPID THERMAL ANNEALING;
RAPID THERMAL PROCESSING;
THIN FILMS;
TRANSPORT PROPERTIES;
ZINC OXIDE;
ALUMINUM;
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EID: 77949425005
PISSN: 09574522
EISSN: 1573482X
Source Type: Journal
DOI: 10.1007/s10854-009-9865-8 Document Type: Article |
Times cited : (12)
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References (10)
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