Characterisation of high-k containing nanolayers by reference-free X-ray fluorescence analysis with synchrotron radiation

ECS Transactions

Volumn 25, Issue 3, 2009, Pages 293-300

  Kolbe, M ^a   Beckhoff, B ^a   Krumrey, M ^a   Reading, M ^b   Van Den Berg, J ^b   Conard, T ^c   De Gendt, S ^c  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b UNIVERSITY OF SALFORD   (United Kingdom)

^c IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

HAFNIUM OXIDES; SEMICONDUCTOR MATERIALS; STORAGE RINGS; SYNCHROTRON RADIATION; X RAYS;

ADVANCED MATERIALS; ELECTRON STORAGE RING; FLUORESCENCE LINES; FLUORESCENCE SIGNALS; PHYSIKALISCH-TECHNISCHE BUNDESANSTALT; THIN OXIDE LAYERS; X RAY FLUORESCENCE ANALYSIS; X-RAY REFLECTOMETRY;

FLUORESCENCE;

EID: 77649194607     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.3204419     Document Type: Conference Paper

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