|
Volumn 96, Issue 7, 2010, Pages
|
A nondestructive analysis of the B diffusion in Ta-CoFeB-MgO-CoFeB-Ta magnetic tunnel junctions by hard x-ray photoemission
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ANNEALING TEMPERATURES;
B DIFFUSION;
BORON DIFFUSIONS;
BULK SENSITIVITY;
COMBINED EFFECT;
CORE LEVEL SPECTROSCOPY;
CRYSTALLINE STRUCTURE;
FERMI ENERGY;
HARD X RAY;
HARD X-RAY PHOTOELECTRON SPECTROSCOPY;
HARD X-RAY PHOTOEMISSION;
MAGNETIC TUNNEL JUNCTION;
NON-DESTRUCTIVE TECHNIQUE;
NONDESTRUCTIVE ANALYSIS;
TUNNELING MAGNETORESISTANCE;
ANNEALING;
BORON;
BORON COMPOUNDS;
COBALT COMPOUNDS;
DIFFUSION IN SOLIDS;
ELECTRIC RESISTANCE;
EMISSION SPECTROSCOPY;
MAGNETIC DEVICES;
MAGNETIC FIELD EFFECTS;
MAGNETOELECTRONICS;
MAGNETORESISTANCE;
PHOTOELECTRICITY;
SPIN DYNAMICS;
TANTALUM;
TUNNEL JUNCTIONS;
TUNNELING (EXCAVATION);
WIND TUNNELS;
X RAY PHOTOELECTRON SPECTROSCOPY;
|
EID: 77249149443
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.3309702 Document Type: Article |
Times cited : (64)
|
References (9)
|