High-resolution, resistless patterning of indium-tin-oxide thin films using excimer laser projection annealing process

Materials Letters

Volumn 64, Issue 8, 2010, Pages 948-950

  Chae, Junghun ^a   Jang, Linus ^a   Jain, Kanti ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

Excimer laser crystallization; High resolution; ITO; Large area patterning

Indexed keywords

ANNEALING PROCESS; CRYSTALLIZATION PROCESS; ETCH RATES; EXCIMER LASER CRYSTALLIZATION; GLASS SUBSTRATES; HIGH RESOLUTION; HIGH-RESOLUTION PATTERNS; INDIUM TIN OXIDE; LARGE-AREA PATTERNING; MICROELECTRONICS INDUSTRY; PATTERN QUALITY; POLYCRYSTALLINE; SELECTIVE CRYSTALLIZATION;

AMORPHOUS MATERIALS; CRYSTALLIZATION; EXCIMER LASERS; GAS LASERS; GLASS LASERS; INDIUM; MICROELECTRONICS; OXIDE FILMS; SUBSTRATES; THIN FILMS; TIN; TITANIUM COMPOUNDS;

ITO GLASS;

EID: 77249149283     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2010.01.068     Document Type: Article

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