Advanced four-mask a-Si TFT array fabrication process using improved materials

Journal of the Society for Information Display

Volumn 11, Issue 1 SPEC., 2003, Pages 203-208

  Song, Jean Ho ^a   Kim, Sang Gab ^a   Park, Hong Sick ^a   Jeong, Chang Oh ^a   Kim, Chi Woo ^a   Chung, K H ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Amorphous silicon; Dry etching; Etchant; Four mask process; Manufacturing method; Process architecture; TFT LCDs

Indexed keywords

AMORPHOUS SILICON; ARRAYS; DRY ETCHING; ELECTRODES; MASKS;

LOW-RESISTANT METALS;

THIN FILM TRANSISTORS;

EID: 0038342056     PISSN: 10710922     EISSN: None     Source Type: Journal    
DOI: 10.1889/1.1831707     Document Type: Conference Paper

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