Near-field ellipsometry for thin film characterization

Optics Express

Volumn 18, Issue 4, 2010, Pages 3298-3310

  Liu, Zhuang ^a,b   Zhang, Ying ^a   Kok, Shaw Wei ^a   Ng, Boon Ping ^a   Soh, Yeng Chai ^b  

^a SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; NANOSTRUCTURED MATERIALS; OPTICAL DATA PROCESSING; THIN FILM DEVICES; THIN FILMS;

EXPERIMENTAL STUDIES; LATERAL RESOLUTION; NANO SCALE; NEAR-FIELD; OPTICAL MEASUREMENT; SCANNING NEAR-FIELD OPTICAL MICROSCOPY; THIN-FILM CHARACTERIZATION;

NEAR FIELD SCANNING OPTICAL MICROSCOPY;

ARTICLE; ARTIFICIAL MEMBRANE; MATERIALS TESTING; METHODOLOGY; SCANNING PROBE MICROSCOPY; SURFACE PROPERTY;

MATERIALS TESTING; MEMBRANES, ARTIFICIAL; MICROSCOPY, SCANNING PROBE; SURFACE PROPERTIES;

EID: 77149176596     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.003298     Document Type: Article

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