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Volumn 87, Issue 5-8, 2010, Pages 947-950
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New hybrid organic-inorganic sol-gel positive resist
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Author keywords
Hybrid organic inorganic materials; Positive resists; Sol gel; X ray lithography
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Indexed keywords
ACIDIC AQUEOUS SOLUTION;
CONVENTIONAL PHOTOLITHOGRAPHY;
DISTINCTIVE FEATURES;
EDGE DEFINITION;
ELECTRO-OPTICAL;
FABRICATION TECHNIQUE;
HIGH CONTRAST;
HYBRID ORGANIC-INORGANIC MATERIALS;
LOW TEMPERATURES;
NANOPATTERNING;
ORGANIC-INORGANIC SOL-GEL;
POLYSILSESQUIOXANES;
POROUS STRUCTURES;
POSITIVE RESISTS;
POSITIVE TONE;
POST-EXPOSURE;
SACRIFICIAL LAYER;
SOFT X-RAY;
STRUCTURAL CHANGE;
SUBMICRON;
SYSTEMATIC INVESTIGATIONS;
TRIETHOXYSILYL;
X RAY IRRADIATION;
X-RAY EXPOSURE;
X-RAY SYNCHROTRON RADIATION;
BENZENE;
GELS;
HYBRID MATERIALS;
OPTICAL PROPERTIES;
SOL-GEL PROCESS;
SOLS;
STRUCTURAL PROPERTIES;
X RAY LITHOGRAPHY;
X RAYS;
SOL-GELS;
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EID: 77149128662
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2009.11.151 Document Type: Article |
Times cited : (16)
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References (14)
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