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Volumn 87, Issue 5-8, 2010, Pages 947-950

New hybrid organic-inorganic sol-gel positive resist

Author keywords

Hybrid organic inorganic materials; Positive resists; Sol gel; X ray lithography

Indexed keywords

ACIDIC AQUEOUS SOLUTION; CONVENTIONAL PHOTOLITHOGRAPHY; DISTINCTIVE FEATURES; EDGE DEFINITION; ELECTRO-OPTICAL; FABRICATION TECHNIQUE; HIGH CONTRAST; HYBRID ORGANIC-INORGANIC MATERIALS; LOW TEMPERATURES; NANOPATTERNING; ORGANIC-INORGANIC SOL-GEL; POLYSILSESQUIOXANES; POROUS STRUCTURES; POSITIVE RESISTS; POSITIVE TONE; POST-EXPOSURE; SACRIFICIAL LAYER; SOFT X-RAY; STRUCTURAL CHANGE; SUBMICRON; SYSTEMATIC INVESTIGATIONS; TRIETHOXYSILYL; X RAY IRRADIATION; X-RAY EXPOSURE; X-RAY SYNCHROTRON RADIATION;

EID: 77149128662     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.11.151     Document Type: Article
Times cited : (16)

References (14)
  • 8
    • 77149149087 scopus 로고    scopus 로고
    • Structural and optical characterization of highly porous thin sol-gel films obtained from aryl polysilsesquioxane precursors
    • in preparation
    • A. Pistore, S. Schutzmann, H.K. Kan, C. Ferraris, F. Romanato, M. Guglielmi, G. Brusatin, Structural and optical characterization of highly porous thin sol-gel films obtained from aryl polysilsesquioxane precursors, in preparation.
    • Pistore, A.1    Schutzmann, S.2    Kan, H.K.3    Ferraris, C.4    Romanato, F.5    Guglielmi, M.6    Brusatin, G.7
  • 14
    • 77149160394 scopus 로고    scopus 로고
    • SPIE Handbook of Microlithography, Micromachining and Microfabrication, 1, 1997 (Section 2.7).
    • SPIE Handbook of Microlithography, Micromachining and Microfabrication, vol. 1, 1997 (Section 2.7).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.