Sensitivity of plasmonic crystal with active solgel thin film

International Journal of Nanoscience

Volumn 8, Issue 1-2, 2009, Pages 131-135

  Kang, Husen Kartasasmita ^a   Wong, Chee Cheong ^a   Romanato, Filippo ^a,b,c   Pistore, A ^b   Brusatin, G ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF PADOVA   (Italy)

^c LABORATORIO TASC   (Italy)

Author keywords

Active solgel and sensitivity; Plasmonics crystals; Plasmonics gratings; Surface plasmon

Indexed keywords

CHLORINE COMPOUNDS; DIELECTRIC MATERIALS; DIELECTRIC PROPERTIES; HYDROCHLORIC ACID; ORGANIC-INORGANIC MATERIALS; PHOTORESISTS; PLASMONICS; POROSITY; REFRACTIVE INDEX; SURFACE PLASMONS; WETTING;

ACTIVE SOLGEL AND SENSITIVITY; BRIDGED POLYSILSESQUIOXANES; EFFECTIVE REFRACTIVE INDEX; ELECTRIC AND MAGNETIC FIELDS; HYBRID ORGANIC-INORGANIC MATERIALS; INTERFERENCE LITHOGRAPHY; OPTICAL CHARACTERISTICS; STRUCTURAL CHARACTERIZATION;

THIN FILMS;

EID: 67650095435     PISSN: 0219581X     EISSN: None     Source Type: Journal    
DOI: 10.1142/s0219581x09005797     Document Type: Article

References (8)

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